机译:天然和RCA处理的Si(111)基板的X射线光电子能谱表征及其对铜酞菁薄膜表面化学的影响
Institute of Physics, Silesian University of Technology, 44-100 Gliwice, Poland;
Institute of Physics, Silesian University of Technology, 44-100 Gliwice, Poland;
Institute of Physical and Theoretical Chemistry, University of Tubingen, D-72076 Tubingen, Germany;
Institute of Physical and Theoretical Chemistry, University of Tubingen, D-72076 Tubingen, Germany;
Institute of Physical and Theoretical Chemistry, University of Tubingen, D-72076 Tubingen, Germany;
Institute of Electronics, Silesian University of Technology, 44-100 Gliwice, Poland;
organic semiconductors; copper phthalocyanine; thin films; x-ray Photoemission Spectroscopy; RCA treatment; silicon native substrate; silicon oxide thickness;
机译:衬底掺杂对Si(111)衬底上酞菁铜超薄膜的表面化学和形貌的影响
机译:Si(111)原生和RCA清洁衬底上沉积的铜酞菁超薄膜的表面形态比较研究
机译:红外反射吸收光谱,X射线光电子能谱和原子力显微镜研究溶液中沉积的蒽醌-2-羧酸在原子(A)(111)原子光滑表面上的吸附状态和形貌
机译:在通过减弱的全反射傅里叶变换红外和X射线光电子光谱研究的氟化物溶液中的氟化物溶液上的铜封端的Si(111)表面上的电磁沉积
机译:通过化学力显微镜和X射线光电子能谱表征化学改性的硅(111),聚甲基丙烯酸甲酯和聚二甲基硅氧烷表面。
机译:X射线光电子能谱揭示SrTiO3薄膜生长过程中的表面终止转化
机译:X射线光电子和吸收光谱法表征β-FeSi2(111)衬底上同质外延β-FeSi2薄膜的表面特性