机译:点缺陷与Si-SiO_2系统中杂质的相互作用及其对界面性能的影响
Tallinn University of Technology, Estonia;
Tallinn University of Technology, Estonia;
Tallinn University of Technology, Estonia;
Tallinn University of Technology, Estonia;
Tartu University, Estonia;
Institute of Chemical Physics and Biophysics, Estonia;
Tallinn University, Estonia;
Riga Technical University, Latvia;
Institute of Ion Beam Physics and Material Research, Forschungszentrum Dresden Rossendorf, Germany;
Institute of Ion Beam Physics and Material Research, Forschungszentrum Dresden Rossendorf, Germany;
Institute of Ion Beam Physics and Material Research, Forschungszentrum Dresden Rossendorf, Germany;
Dresden High Magnetic Field Laboratory, Forschungszentrum Dresden Rossendorf, Germany;
Dresden High Magnetic Field Laboratory, Forschungszentrum Dresden Rossendorf, Germany;
Dresden High Magnetic Field Laboratory, Forschungszentrum Dresden Rossendorf, Germany;
Dresden High Magnetic Field Laboratory, Forschungszentrum Dresden Rossendorf, Germany;
point defects; electron paramagnetic resonance; nuclear magnetic resonance; Si-SiO_2;
机译:点缺陷与Si-SiO2系统中杂质的相互作用及其对界面性能的影响
机译:Si-SiO_2结构中杂质与点缺陷的相互作用及其对界面性能的影响
机译:Si-SiO_2体系形成过程中点缺陷,扩展缺陷和杂质之间的相互作用
机译:点缺陷与Si-SiO_2系统中杂质的相互作用及其对界面性能的影响
机译:石墨烯基表面上的二次相互作用对纳米结构系统动力学和力学性能的影响
机译:2-氨基-4-甲基吡啶的影响和2-氨基嘧啶丙二酸-铜(II)系统上的配体:通过超分子的见解相互作用和光响应特性
机译:献给纪念UlrichGösele教授。 Si-SiO2体系中点缺陷与杂质的相互作用及其对界面性质的影响