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Photoemission study of the tin doped cerium oxide thin films prepared by RF magnetron sputtering

机译:射频磁控溅射制备锡掺杂二氧化铈薄膜的光发射研究

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摘要

Ce-Sn-O mixed oxide films prepared by simultaneous Sn metal and cerium oxide magnetron sputtering were studied by high resolution photoemission. The analysis showed that the degree of reduction of the cerium oxide depends on the tin concentration in the film. Ce~(4+) →Ce~(3+) conversion is explained by a charge transfer from Sn atoms to unoccupied orbital Ce 41° of cerium oxide by forming Ce 4f state. The X-ray Photoelectron Spectroscopy data were compared with study of the single-crystalline CeO_2 thin films and Sn/CeO_2(111) model system prepared and studied in situ excluding air exposure effects.
机译:通过高分辨率光发射研究了同时锡金属和氧化铈磁控溅射制备的Ce-Sn-O混合氧化物薄膜。分析表明,氧化铈的还原程度取决于膜中锡的浓度。 Ce〜(4+)→Ce〜(3+)的转化是通过形成Ce 4f态从Sn原子到氧化铈的未占据轨道Ce 41°的电荷转移来解释的。将X射线光电子能谱数据与单晶CeO_2薄膜和原位制备和研究的Sn / CeO_2(111)模型系统进行了比较,排除了空气暴露的影响。

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  • 来源
    《Thin Solid Films》 |2010年第8期|2206-2209|共4页
  • 作者单位

    Charles University, Faculty of Mathematics and Physics, Department of Surface and Plasma Science, V Holesovickach 2, 18000 Prague 8, Czech Republic National Institute for Materials Science, Nanomaterials Assembly Croup, 3-12, Sakura, Tsukuba, 305-0003, Japan;

    rnSincrotrone Trieste, Strada Statale 14, km 163.5, 34149 Basovizza-Trieste, Italy;

    rnCharles University, Faculty of Mathematics and Physics, Department of Surface and Plasma Science, V Holesovickach 2, 18000 Prague 8, Czech Republic;

    rnCharles University, Faculty of Mathematics and Physics, Department of Surface and Plasma Science, V Holesovickach 2, 18000 Prague 8, Czech Republic National Institute for Materials Science, Nanoionics Materials Croup, 7-1 Namiki, Tsukuba 305-0044, Japan;

    rnNational Institute for Materials Science, Nanoionics Materials Croup, 7-1 Namiki, Tsukuba 305-0044, Japan;

    rnNational Institute for Materials Science, Nanoionics Materials Croup, 7-1 Namiki, Tsukuba 305-0044, Japan;

    rnNational Institute for Materials Science, Nanoionics Materials Croup, 7-1 Namiki, Tsukuba 305-0044, Japan;

    rnNational Institute for Materials Science, NIMS Beamline station, Sayo, Hyogo 679-5198, Japan;

    rnNational Institute for Materials Science, Nanomaterials Assembly Croup, 3-12, Sakura, Tsukuba, 305-0003, Japan;

    rnNational Institute for Materials Science, NIMS Beamline station, Sayo, Hyogo 679-5198, Japan;

    rnCharles University, Faculty of Mathematics and Physics, Department of Surface and Plasma Science, V Holesovickach 2, 18000 Prague 8, Czech Republic;

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  • 正文语种 eng
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  • 关键词

    tin-cerium mixed oxide; reduction; bimetallic interaction; magnetron sputtering; photoelectron spectroscopy; synchrotron radiation;

    机译:锡铈混合氧化物减少;双金属相互作用磁控溅射;光电子能谱同步辐射;

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