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The effect of annealing on single-layer CoCrPtNb thin films

机译:退火对单层CoCrPtNb薄膜的影响

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摘要

The effect of Nb addition on grain size segregation and intergranular coupling of ternary CoCrPt alloys prepared by annealing of crystalline samples and crystallization of the Nb-rich (more than 4.6 at.%) amorphous films is investigated. Mean surface roughness as a function of Nb addition decreased for Nb contents of up to 2.7 at.% and then increased. The size and distribution of magnetic clusters were significantly affected by Nb addition. Vacuum annealing of the ternary and quaternary films (2.7 at.% Nb) increased the coercivity of the films from 53.71 kA/m and 52.09 kA/m to about 61.14 kA/m and 105 kA/m, respectively. Film with 12.1 at.% Nb was also produced and then annealed at different times and temperatures. Increasing the temperature to 700 ℃ caused the recrystallization of the 12.1 at.% Nb amorphous film. The observed magnetic properties are discussed in terms of composition, crystallographic orientation of deposited layer and oxidation of elements during annealing.
机译:研究了添加Nb对通过结晶样品的退火和富Nb(大于4.6 at。%)非晶膜的结晶制备的三元CoCrPt合金晶粒尺寸偏析和晶间耦合的影响。当Nb含量高达2.7 at。%时,平均表面粗糙度随Nb的添加而降低,然后增加。 Nb的添加对磁团簇的大小和分布有显着影响。三元和四元薄膜(2.7at。%Nb)的真空退火将薄膜的矫顽力从53.71 kA / m和52.09 kA / m分别提高到约61.14 kA / m和105 kA / m。还生产了具有12.1 at。%Nb的薄膜,然后在不同的时间和温度下进行退火。将温度提高到700℃会引起12.1 at。%Nb非晶膜的重结晶。根据组成,沉积层的晶体学取向和退火过程中元素的氧化讨论了观察到的磁性能。

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