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首页> 外文期刊>Thin Solid Films >Electrical characterization of the polyaniline/p-silicon and polyaniline titanium dioxide tetradecyltrimethylammonium bromide /p-silicon heterojunctions
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Electrical characterization of the polyaniline/p-silicon and polyaniline titanium dioxide tetradecyltrimethylammonium bromide /p-silicon heterojunctions

机译:聚苯胺/对硅和聚苯胺二氧化钛十四烷基三甲基溴化铵/对硅异质结的电学表征

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摘要

Au/PANI/p-Si/Al and Au/PANI TiO_2 TTAB/p-Si/Al heterojunctions have been fabricated by spin coating of soluble polyaniline (PAN1) and PANI titanium dioxide (TiO_2) tetradecyltrimethylammonium bromide (TTAB) on the chemically cleaned p-Si substrates. The thicknesses of the polymeric films have been determined by a profilometer. The current-voltage (I-V) characteristics of the heterojunctions have been obtained in the temperature range of 98-258 K. These devices have showed the rectifying behavior such as diode. The I-V characteristics of the devices have been analyzed on the basis of the standard thermionic emission theory at low forward bias voltage regime. It has been shown that the values of ideality factor decrease while the values of barrier height increase with increasing temperature. This temperature dependence has been attributed to the presence of barrier inhomogeneities at the organic/inorganic semiconductor interface. Furthermore, analysis of the double logarithmic I-V plots at higher forward bias voltages at all temperatures indicates that transport through the organic thin film is explained by a space-charge-limited current process characterized by exponential distribution of traps within the band gap of the organic film. The total concentration of traps has been found to be 3.52 × 10~(14)cm~(-3) and 3.14 ×10~(15)cm~(-3) for PANI and PANI TiO_2 TTAB layer, respectively.
机译:Au / PANI / p-Si / Al和Au / PANI TiO_2 TTAB / p-Si / Al异质结是通过在化学清洗后旋涂可溶性聚苯胺(PAN1)和PANI二氧化钛(TiO_2)十四烷基三甲基溴化铵(TTAB)制成的p-Si衬底。聚合物膜的厚度已经通过轮廓仪确定。在98-258 K的温度范围内获得了异质结的电流-电压(I-V)特性。这些器件表现出整流性能,例如二极管。在标准的热电子发射理论的基础上,在低正向偏置电压条件下分析了器件的I-V特性。已经表明,理想因子的值随着温度的升高而减小,而势垒高度的值则随着温度的升高而增加。这种温度依赖性归因于在有机/无机半导体界面处存在阻挡层不均匀性。此外,在所有温度下在较高正向偏置电压下的双对数IV曲线分析表明,通过有机薄膜的传输是通过空间电荷受限的电流过程来解释的,该过程的特征是陷阱在有机膜的带隙内呈指数分布。发现PANI和PANI TiO_2 TTAB层的陷阱总浓度分别为3.52×10〜(14)cm〜(-3)和3.14×10〜(15)cm〜(-3)。

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  • 来源
    《Thin Solid Films》 |2010年第8期|2216-2221|共6页
  • 作者单位

    Erciyes University, Graduate School of Natural and Applied Sciences, Department of Physics, 38039 Kayseri, Turkey;

    Bozok University, Faculty of Arts and Sciences, Department of Physics, 66100 Yozgat, Turkey;

    Sueleyman Demirel University, Faculty of Arts and Sciences, Department of Chemistry, 32260 Isparta, Turkey;

    Erciyes University, Faculty of Arts and Sciences, Department of Physics, 38039 Kayseri, Turkey;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    polymer; silicon; schottky barrier; heterojunction; current-voltage characteristics;

    机译:聚合物;硅;肖特基势垒异质结电流电压特性;

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