首页> 外文期刊>Thin Solid Films >Enhanced tunable dielectric properties of Ba_(0.5)Sr_(0.5)TiO_3/Bi_(1.5)Zn_(1.0)Nb_(1.5)O_7 multilayer thin films by a sol-gel process
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Enhanced tunable dielectric properties of Ba_(0.5)Sr_(0.5)TiO_3/Bi_(1.5)Zn_(1.0)Nb_(1.5)O_7 multilayer thin films by a sol-gel process

机译:溶胶-凝胶法提高Ba_(0.5)Sr_(0.5)TiO_3 / Bi_(1.5)Zn_(1.0)Nb_(1.5)O_7多层薄膜的可调介电性能

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摘要

Ba_(0.5)Sr_(0.5)TiO_3(BST)/Bi_(1.5)Zn_(1.0)Nb_(1.5)O_7(BZN) multilayer thin films were prepared on Pt/Ti/SiO_2/Si substrates by a sol-gel method. The structures and morphologies of BST/BZN multilayer thin films were analyzed by X-ray diffraction (XRD) and field-emission scanning electron microscope. The XRD results showed that the perovskite BST and the cubic pyrochlore BZN phases can be observed in the multilayer thin films annealed at 700 ℃ and 750 ℃. The surface of the multilayer thin films annealed at 750 ℃ was smooth and crack-free. The BST/BZN multilayer thin films annealed at 750 ℃ exhibited a medium dielectric constant of around 147, a low loss tangent of 0.0034, and a relative tunability of 12% measured with dc bias field of 580 kV/cm at 10 kHz.
机译:通过溶胶凝胶法在Pt / Ti / SiO_2 / Si衬底上制备了Ba_(0.5)Sr_(0.5)TiO_3(BST)/ Bi_(1.5)Zn_(1.0)Nb_(1.5)O_7(BZN)多层薄膜。用X射线衍射(XRD)和场发射扫描电子显微镜对BST / BZN多层薄膜的结构和形貌进行了分析。 X射线衍射结果表明,在700℃和750℃退火的多层薄膜中可以观察到钙钛矿BST相和立方烧绿石BZN相。经750℃退火的多层薄膜表面光滑无裂纹。在750℃退火的BST / BZN多层薄膜表现出约147的中介电常数,0.0034的低损耗角正切,在10 kHz的直流偏置电场为580 kV / cm时测得的相对可调性为12%。

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  • 来源
    《Thin Solid Films》 |2011年第2期|p.789-792|共4页
  • 作者单位

    School of Materials Science and Engineering, Chang'an University, Xi'an 710064, China,Shenzhen Key Laboratory of Special Functional Materials, Shenzhen University, Shenzhen 518060, China,Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education, Xi'an Jiaotong University, Xi'an 710049, China;

    Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education, Xi'an Jiaotong University, Xi'an 710049, China;

    Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education, Xi'an Jiaotong University, Xi'an 710049, China;

    Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education, Xi'an Jiaotong University, Xi'an 710049, China;

    Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education, Xi'an Jiaotong University, Xi'an 710049, China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    dielectric materials; multilayer thin films; rapid thermal annealing; sol-gel process; tunable dielectric properties;

    机译:电介质材料;多层薄膜;快速热退火;溶胶-凝胶法可调介电性能;

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