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机译:同步和异步双极脉冲脉冲磁控溅射沉积CrAIN薄膜的相和微观结构
Advanced Coatings and Surface Engineering Laboratory (ACSEL), Colorado School of Mines, Golden, Colorado, 80407, USA;
Nuckar Research Center, Negev, 85025, Israel;
Advanced Coatings and Surface Engineering Laboratory (ACSEL), Colorado School of Mines, Golden, Colorado, 80407, USA,Reactive Sputtering, Inc., 2152 Coya Place, San Marcos, Catifomia, 92078, USA;
Advanced Coatings and Surface Engineering Laboratory (ACSEL), Colorado School of Mines, Golden, Colorado, 80407, USA;
chromium aluminum nitride; thin films; pulsed DC magnetron sputtering; closed field unbalanced magnetron; sputtering; ion energy distribution; nanocrystalline;
机译:异步脉冲参数对脉冲闭合场不平衡磁控溅射(P-CFUBMS)沉积CrAIN膜的结构和性能的影响
机译:Cu的作用对由高功率脉冲磁控溅射和脉冲DC磁控溅射组合的混合系统沉积的TIB2膜微观结构和性能
机译:直流磁控溅射和大功率脉冲磁控溅射沉积在Si(100)上的AlN薄膜的六方相和立方相
机译:非对称双极脉冲反应磁控溅射沉积Ti-Co-La-N薄膜的性能
机译:通过大功率脉冲磁控溅射沉积的银膜的电学和光学性质。
机译:低温下大功率脉冲磁控溅射在铀上沉积的TiN膜
机译:通过高功率脉冲磁控溅射和直流磁控溅射在含氢等离子体中沉积的β-Ta和α-Cr薄膜