机译:在GaAs(011)_(B3)单晶衬底上制备亚稳态bcc永久外延薄膜
Faculty of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo-ku, Tokyo 112-8551, Japan;
Faculty of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo-ku, Tokyo 112-8551, Japan;
Faculty of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo-ku, Tokyo 112-8551, Japan;
Graduate School of Fine Arts, Tokyo National University of Fine Arts and Music, 12-8 Ueno-koen, Taito-ku, Tokyo 110-8714, Japan;
Faculty of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo-ku, Tokyo 112-8551, Japan;
bcc permalloy thin film; metastable; epitaxial growth; GaAs(110) single-crystal substrates;
机译:GaAs(110)_(B3)单晶衬底上外延生长的bcc-Co薄膜的微观结构和磁性
机译:在不同取向的GaAs单晶衬底上制备的亚稳态bcc-Ni和bcc-NiFe单晶膜
机译:GaAs(100)单晶衬底上外延生长有bcc基 A i> 2结构的Co薄膜的结构表征
机译:绝缘单晶基板上FECO外延薄膜的制备与结构特征
机译:在非晶衬底和用于3D集成电路的高性能亚100 nm薄膜晶体管上的纳米图形引导的单晶硅生长。
机译:亚稳态Ca2IrO4外延薄膜的研究:与Sr2IrO4和Ba2IrO4的系统比较
机译:GAAS上的表皮单晶超薄膜FE3SI薄膜的磁性
机译:bcc过渡金属薄膜和超晶格在mgO(111),(011)和(001)衬底上的外延生长