首页> 外文期刊>Thin Solid Films >Thermal conductivity and sound velocity measurements of plasma enhanced chemical vapor deposited a-SiC:H thin films
【24h】

Thermal conductivity and sound velocity measurements of plasma enhanced chemical vapor deposited a-SiC:H thin films

机译:等离子体增强化学气相沉积a-SiC:H薄膜的热导率和声速测量

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

We report ultrafast optical measurements of the thermal conductivity and longitudinal sound velocity for a-SiCH thin films deposited by plasma enhanced chemical vapor deposition (PECVD). Porous and non-porous films with mass densities ranging from 1.0-2.5 g/crri~3 were obtained by intentionally varying the PECVD process conditions. The longitudinal sound velocities for these materials as determined by picosecond ultrasonics ranged from 2370 m/s to 10460 m/s, and the Young's modulus determined from the sound velocity measurements ranged from 5-200 GPa. Time domain thermoreflectance measurements determined the thermal conductivity to range from 0.0009 W/cmK to 0.042 W/cmK.
机译:我们报告了通过等离子体增强化学气相沉积(PECVD)沉积的a-SiCH薄膜的热导率和纵向声速的超快光学测量。通过有意地改变PECVD工艺条件,获得了密度为1.0-2.5 g / crri〜3的多孔和无孔薄膜。由皮秒超声确定的这些材料的纵向声速范围为2370 m / s至10460 m / s,根据声速测量确定的杨氏模量范围为5-200 GPa。时域热反射率测量确定的导热率范围为0.0009 W / cmK至0.042 W / cmK。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号