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Oxygen vacancy in A1_2O_3: Photoluminescence study and first-principle simulation

机译:A1_2O_3中的氧空位:光致发光研究和第一性原理模拟

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摘要

Broad photoluminescence (PL) band at 2.97 eV excited in the band near 6.0 eV in amorphous chemical vapor deposition films is related to the neutral oxygen vacancy by analogy with crystalline Al_2O_3. The identification of this PL band was supported by the results of first-principle quantum chemical simulation, which showed 6.3 and 6.4 eV bands in the extinction spectra for a- and ;-Al_20_3, respectively. Other PL bands are attributed to ionized single vacancies (F~+-centers), divacancies (F_2) and, probably, interstitial Al.
机译:在非晶态化学气相沉积膜中,在接近6.0 eV的波段中激发的2.97 eV的宽光致发光(PL)波段与晶体Al_2O_3类似,与中性氧空位有关。第一原理量子化学模拟的结果支持了该PL波段的鉴定,第一原理量子化学模拟结果在a-和;-Al_20_3的消光光谱中分别显示了6.3和6.4 eV波段。其他PL带归因于电离的单空位(F〜+-中心),双空位(F_2)以及可能的间隙Al。

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