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机译:具有MgO或TiN缓冲层的硅衬底上高取向Sr_0.75Ba_0.25Nb_2O_6薄膜的生长和性能
State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Hangzhou 310027, Zhejiang, People's Republic of China;
State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Hangzhou 310027, Zhejiang, People's Republic of China;
State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Hangzhou 310027, Zhejiang, People's Republic of China;
sr_0.75ba_0.25nb_2o_6; self-buffer layer; direct current reactive sputtering; preferred crystalline orientation; energy-dispersive spectrometry; sellmeier dispersion model; x-ray diffraction;
机译:通过高质量的碳化硅缓冲层在硅衬底上异质外延生长光滑连续的金刚石薄膜
机译:射频磁控溅射在Si(100)衬底上生长的高c轴织构MgO缓冲层的制备和表征,用作铁电薄膜的生长模板
机译:射频磁控溅射在Si(100)衬底上生长的高c轴织构MgO缓冲层的制备和表征,用作铁电薄膜的生长模板
机译:Bazro_3缓冲层对MgO(001)衬底的纹理YBCO薄膜生长的Bazro_3缓冲层的生长和表征
机译:硅衬底上氧化锌薄膜的外延生长和性能。
机译:MgO(001)衬底上的薄膜PdFe / VN和VN / PdFe双层薄膜的外延生长和超导性能
机译:使用K:SBN模板层通过溶胶-凝胶工艺在Si衬底上生长高取向铌酸锶钡锶薄膜