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Optical, electrical and structural properties of Cu_2Te thin films deposited by magnetron sputtering

机译:磁控溅射沉积Cu_2Te薄膜的光学,电学和结构性质

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Thin films of Cu_2Te were deposited, at room temperature, on glass substrates by magnetron sputtering from independent Cu and Te sources. This work presents the effect of annealing temperature on the optical, structural, and electrical properties of sputtered Cu_2Te films. Annealing above 300 ℃ resulted in stoichiometric and near stoichiometric Cu_2Te phases, whereas temperatures above 400 ℃ yielded films with single Cu_2Te phase. In contrast, annealing at temperatures of 250 ℃ and below resulted in mixed phases of CuTe, Cu_7Te_5, Cu_1.8Te, and Cu_2Te. Analyses of transmittance and reflectance measurements for Cu_2Te indicate that photon absorption occurs via indirect band transitions for incident photons with energy above the band gap energy and free carrier absorption below the band gap energy. The determined indirect band gap was 0.90 eV and its associated phonon energy was 0.065 eV. Optical phonon scattering was identified as the mechanism through which the momentum is conserved during absorption by free carriers. Electrical measurements show p-type conductivity and highly degenerate semiconducting behavior with a hole carrier concentrationp = 5.18 ×10~21 cm~-3.
机译:在室温下,通过磁控溅射从独立的Cu和Te来源在玻璃基板上沉积Cu_2Te薄膜。这项工作提出了退火温度对溅射的Cu_2Te薄膜的光学,结构和电学性质的影响。 300℃以上的退火导致化学计量和接近化学计量的Cu_2Te相,而400℃以上的温度则产生具有单一Cu_2Te相的薄膜。相反,在250℃及以下的温度下退火会导致CuTe,Cu_7Te_5,Cu_1.8Te和Cu_2Te的混合相。 Cu_2Te的透射率和反射率测量结果的分析表明,光子吸收是通过入射光子的间接带跃迁而发生的,入射光子的能量高于带隙能量,而自由载流子吸收低于带隙能量。测得的间接带隙为0.90 eV,其相关的声子能量为0.065 eV。光子声子散射被认为是在自由载流子吸收过程中保持动量的机制。电学测量表明p型电导率和高度简并的半导体行为,空穴载流子浓度p = 5.18×10〜21 cm〜-3。

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