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Structural and opto-electrical properties of the tin-doped indium oxide thin films fabricated by the wet chemical method with different indium starting materials

机译:不同铟起始材料湿化学法制备的掺锡氧化铟薄膜的结构和光电性能

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摘要

Tin-doped indium oxide (ITO) thin films were fabricated by the sol-gel spin-coating method with different indium precursor solutions synthesized from In(NO_3)3 or InCb (denoted as N-ITO and Cl-ITO, respectively). For both N-ITO and Cl-ITO thin films, the increase of mobility/conductivity and the reduction of carrier concentration with increasing annealing temperatures from 400 to 700 ℃ are related to the increase of crystallization/densification and the annihilation of oxygen vacancies. The refractive index (1.84 at nductivity [(234 (These properties make the indium nitrate-derived ITO thin films have better potential applications for some commercial products.
机译:通过溶胶-凝胶旋涂法,使用由In(NO_3)3或InCb(分别表示为N-ITO和Cl-ITO)合成的不同铟前驱体溶液制备了掺锡氧化铟(ITO)薄膜。对于N-ITO和Cl-ITO薄膜,随着退火温度从400到700℃的增加,迁移率/电导率的增加和载流子浓度的降低与结晶/致密化的增加和氧空位的an灭有关。折射率(在导电率下为1.84 [[234(这些特性使硝酸铟衍生的ITO薄膜在某些商业产品中具有更好的潜在应用。

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