机译:前驱体蒸发温度对微波电子回旋共振等离子体辅助金属有机化学气相沉积沉积氧化钇薄膜性能的影响
Laser and Plasma Technology Division, Bhabha Atomic Research Center, Trombay, Mumbai 400 085, India;
Technical Physics Division, Bhabha Atomic Research Center, Trombay, Mumbai 400 085, India;
Technical Physics Division, Bhabha Atomic Research Center, Trombay, Mumbai 400 085, India;
High Pressure and Synchrotron Physics Division, Bhabha Atomic Research Center, Trombay, Mumbai 400 085, India;
Applied Spectroscopy Division, Bhabha Atomic Research Center, Trombay, Mumbai 400 085, India;
Chemistry Division, Bhabha Atomic Research Center, Trombay, Mumbai 400 085, India;
Materials Science Division, Bhabha Atomic Research Center, Trombay, Mumbai 400 085, India;
Institute of Chemical Technology, University of Mumbai, Mumbai 400 019, India;
Laser and Plasma Technology Division, Bhabha Atomic Research Center, Trombay, Mumbai 400 085, India;
Laser and Plasma Technology Division, Bhabha Atomic Research Center, Trombay, Mumbai 400 085, India;
microwave electron cyclotron; resonance plasma; metal organic chemical vapor deposition; thin films; yttrium oxide; far-infrared; thermogravimetry;
机译:电子回旋共振-金属有机化学气相沉积质子交换膜燃料在不锈钢316双极板上沉积氟掺杂锌和镓锡氧化物复合薄膜的特性比较
机译:脉冲液体注入等离子体增强金属有机化学气相沉积法沉积氧化钇和硅酸钇薄膜的微观结构和电学性质
机译:O_2和N_2退火对电子回旋共振等离子体增强化学气相沉积法制备氧化钽薄膜电学性能的影响。
机译:室温的组成依赖性1.54MUM MER〜3 +来自铒掺杂硅的发光:通过电子回旋共振等离子体沉积的氧薄膜增强化学气相沉积
机译:微波等离子体电子回旋共振化学气相沉积法沉积的纳米晶和非晶硅薄膜晶体管:材料分析,器件制造和表征。
机译:金属有机化学气相沉积(MOCVD)异质外延Pr0.7Ca0.3MnO3薄膜的合成:工艺条件对结构/形态和功能特性的影响
机译:等离子体辅助金属有机化学气相沉积法在Si(111)衬底上生长AlxGa1-xN / GaN异质结构薄膜的微观结构和光学性质
机译:通过微波等离子体辅助化学气相沉积在高温下高生长率同质外延金刚石膜沉积