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机译:射频磁控溅射沉积a-SiC:H和a-SiC薄膜中退火和氧化效应的比较研究
Lashkaryov Institute of Semiconductor Physics. Kiev, 03028, Ukraine;
Department of Materials, Physics and Energy Engineering, Nagoya University, 464-8603, Japan;
Japan Fine Ceramics Center, Nagoya, 456-8587 Japan;
Lashkaryov Institute of Semiconductor Physics. Kiev, 03028, Ukraine;
Department of Materials, Physics and Energy Engineering, Nagoya University, 464-8603, Japan;
Lashkaryov Institute of Semiconductor Physics. Kiev, 03028, Ukraine;
Lashkaryov Institute of Semiconductor Physics. Kiev, 03028, Ukraine;
amorphous silicon carbide; hydrogenated amorphous silicon carbide; annealing; oxidatin;
机译:基板温度对射频磁控溅射沉积a-SiC:H薄膜的(微米/纳米)结构的影响。
机译:溅射沉积a-SiC和a-SiC x sub> N y sub>薄膜的激光退火
机译:热退火对射频磁控溅射沉积Al掺杂ZnO薄膜结构,电学和力学性能的影响
机译:上下溅射直流磁控管对a-SiC和a-SiC:H薄膜的SIMS和螺旋钻研究,对光学性能的影响
机译:直流反应磁控溅射沉积的新型薄膜透明导电氧化物。
机译:快速热退火用于射频磁控溅射沉积的高质量ITO薄膜
机译:热退火对DC磁控溅射沉积的A-SiC薄膜的光学和结构性能的影响