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机译:溅射沉积Nb掺杂的透明导电氧化钛薄膜的结构和表面性能研究
Ubiquitous MEMS and Mico Engineering Research Center(UMEMSME), National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba,Ibaraki 305-8564, Japan;
Materials Research Institute for Sustainable Development(MRISUS), AIST, 2266-98 Anagahora, Shimo-shidami, Moriyama-ku, Nagoya 463-8560, Japan;
Advanced Manufacturing Research Institute (AMRI), AIST, 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan;
Advanced Manufacturing Research Institute (AMRI), AIST, 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan;
Advanced Manufacturing Research Institute (AMRI), AIST, 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan;
titanium oxide; transparent conducting oxides; X-ray photoelectron spectroscopy; ultra-violet photoelectron spectroscopy; work function; thin film; sputtering;
机译:射频磁控共溅射沉积透明导电钛铟锌氧化物/ Ag /钛铟锌氧化物多层膜
机译:射频磁控溅射使用高质量陶瓷靶沉积Nb掺杂的ZnO透明导电薄膜的性能
机译:射频磁控溅射使用高质量陶瓷靶沉积Nb掺杂的ZnO透明导电薄膜的性能
机译:磁控溅射沉积镓和钛掺杂氧化锌膜的结构性能研究
机译:通过中和离子束溅射和脉冲激光沉积沉积的n型薄膜透明导电氧化物的电学和光学性质的制备和表征。
机译:退火对溅射生长铋钛氧化物薄膜结构和光学性能的影响
机译:溅射氧化锡和氧化钛薄膜作为替代的透明导电氧化物