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机译:Ar / H_2比对电子回旋共振等离子体增强化学气相沉积法制备掺磷氢化纳米晶硅薄膜特性的影响
Key laboratory of Materials Modification, Dalian University of Technology, Ministry of Education, Dalian 116024 China,School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024 China;
Key laboratory of Materials Modification, Dalian University of Technology, Ministry of Education, Dalian 116024 China,School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024 China;
Key laboratory of Materials Modification, Dalian University of Technology, Ministry of Education, Dalian 116024 China,School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024 China;
Key laboratory of Materials Modification, Dalian University of Technology, Ministry of Education, Dalian 116024 China,School of Physics and Optoelectronic Engineering, Dalian 116024 China;
School of Physics and Optoelectronic Engineering, Dalian 116024 China;
Ar/H_2; nc-Si:H; ECR-PECVD; doping;
机译:等离子体增强化学气相沉积氢化纳米晶硅薄膜的制备及结晶特性
机译:用SiH_4 / CH_4 / H_2 / N_2气体通过热线化学气相沉积法制备的高导电氮掺杂氢化纳米晶立方碳化硅薄膜
机译:电子回旋共振等离子体增强化学气相沉积法制备的聚合物碳薄膜的耐等离子体刻蚀性能
机译:用电子回旋谐振等离子体化学气相沉积制备氢化非晶碳化硅膜微观结构和光学性能的影响
机译:微波等离子体电子回旋共振化学气相沉积法沉积的纳米晶和非晶硅薄膜晶体管:材料分析,器件制造和表征。
机译:CVD石墨烯上等离子增强化学气相沉积法制备的无转移反型石墨烯/硅异质结构
机译:偏压对电子回旋共振等离子体在CoCrMo合金上制备的氢化非晶碳膜性能的影响增强了化学气相沉积(ECR-PECVD)
机译:衬底温度和氢稀释比对热线化学气相沉积法生长纳米硅薄膜性能的影响