Proceedings of the 3rd International Conference on Microelectronics and Plasma Technology (ICMAP 2011), Dalian, China

摘要

The International Conference on Microelectronics and Plasma Technology (ICMAP) was initiated in 2008, Jeju, Korea, to provide an open forum for discussing state-of-the-art scientific and technological achievements in plasma R&D fields. ICMAP 2009 was successfully held in Busan, Korea in conjunction with other international conferences on plasma and dry process technologies; the International Conference on Plasma Surface Engineering (PSE 2009) and the 31st International Symposium on Dry Process (DPS 2009). As continuing efforts to provide more in-depth discussion on the topics covered in the conference, ICMAP 2011 was held in Dalian, China, July 4 to July 7, 2011, to expand the perspectives of the conference and unceased outreach to the international community.