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首页> 外文期刊>Thin Solid Films >Role of hydrogen in Sb film deposition and characterization of Sb and Ge_xSb_y films deposited by cyclic plasma enhanced chemical vapor deposition using metal-organic precursors
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Role of hydrogen in Sb film deposition and characterization of Sb and Ge_xSb_y films deposited by cyclic plasma enhanced chemical vapor deposition using metal-organic precursors

机译:氢在Sb膜沉积中的作用以及使用金属有机前体的循环等离子体增强化学气相沉积法沉积Sb和Ge_xSb_y膜的特性

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摘要

To meet increasing demands for chemical vapor deposition methods for high performance phase-change memory, cyclic plasma enhanced chemical vapor deposition of Sb and Ge_xSb_y phase-change films and char acterization of their properties were performed. Two cycle sequences were designed to investigate the role of hydrogen gas as a reduction gas during Sb film deposition. Hydrogen gas was not introduced into the reaction chamber during the purge step in cycle sequence A and was introduced during the purge step for cycle se quence B. The role of hydrogen gas was investigated by comparing the results obtained from these two cycle sequences and was concluded to exert an effect by a combination of precursor decomposition, surface maintenance as a hydrogen termination agent, and surface etching. These roles of hydrogen gas are discussed through consideration of changes in deposition rates, the oxygen concentration on the surface of the Sb film, and observations of film surface morphology. Based on these results, Ge_xSb_y phase-change films were depos ited with an adequate flow rate of hydrogen gas. The Ge and Sb composition of the film was controlled with the designed cycle sequences. A strong oxygen affinity for Ge was observed during the X-ray photoelectron spectroscopy analysis of Sb 3d, Sb 4d, and Ge 3d orbitals. Based on the XPS results, the ratios of Ge to Sb were calculated to be Ge_(0.32)Sb_(0.68), Ge_(0.38)Sb_(0.62) Ge_(0.44)Sb_(0.56), Ge_(0.51)Sb_(0.49) and Ge_(0.67)Sb_(0.33) for the G1S7, G1S3, G1S2, G1S1, and G2S1 cycles, respectively. Crystal structures of Sb, Ge, and the GeSb metastable phase were observed with various GexSby film compositions. Sb crystallinity decreased with respect to Ge crystal Unity by increasing the Ge fraction. A current-voltage curve was introduced, and an electro-switching phe nomenon was clearly generated at a typical voltage, Vth. Vth values increased in conjunction with an increased proportion of Ge. The Sb crystallinity decrease and Vth increase were explained via the bonding characteristics of each element.
机译:为了满足对用于高性能相变存储器的化学气相沉积方法不断增长的需求,对Sb和Ge_xSb_y相变膜进行了循环等离子体增强化学气相沉积并对其性质进行了表征。设计了两个循环序列以研究氢气在Sb膜沉积过程中作为还原气体的作用。在循环顺序A的吹扫步骤中未将氢气引入反应室,而在循环顺序B的吹扫步骤中未将氢气引入反应室。通过比较这两个循环顺序获得的结果,研究了氢气的作用,并得出结论通过前体分解,作为氢终止剂的表面保持和表面蚀刻相结合来发挥作用。通过考虑沉积速率的变化,Sb膜表面上的氧气浓度以及对膜表面形态的观察来讨论氢气的这些作用。基于这些结果,以适当的氢气流量沉积了Ge_xSb_y相变膜。用设计的循环顺序控制薄膜的Ge和Sb组成。在对Sb 3d,Sb 4d和Ge 3d轨道进行X射线光电子能谱分析期间,观察到了对Ge的强氧亲和力。根据XPS结果,计算出Ge与Sb的比率为Ge_(0.32)Sb_(0.68),Ge_(0.38)Sb_(0.62)Ge_(0.44)Sb_(0.56),Ge_(0.51)Sb_(0.49) G1S7,G1S3,G1S2,G1S1和G2S1周期分别为Ge_(0.67)Sb_(0.33)。用各种GexSby薄膜成分观察到Sb,Ge和GeSb亚稳相的晶体结构。通过增加Ge分数,相对于Ge晶体Unit,Sb结晶度降低。引入了电流-电压曲线,并且在典型电压Vth上清楚地产生了电开关现象。 Vth值随着Ge比例的增加而增加。通过各元素的结合特性来说明Sb结晶度降低和Vth升高。

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