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Preparation of high quality spray-deposited fluorine-doped tin oxide thin films using dilute di(n-butyl)tin(iv) diacetate precursor solutions

机译:使用稀二乙酸二正丁基锡(iv)前驱体溶液制备高质量的喷镀氟掺杂氧化锡薄膜

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Fluorine-doped tin oxide (FTO) thin films were prepared, at different substrate temperatures, using dilute precursor solutions of di(n-butyl)tin(iv) diacetate (0.1 M DBTDA) by varying the F~- concentration in the solution. It is noticed that conductivity of FTO film is increasing by increasing the fluorine amount in the solution. Morphology of SEM image reveals that grain size and its distribution are totally affected by the substrate temperature in which conductivity is altered. Among these FTO films, the best film obtained gives an electronic conductivity of 31.85xlO~2 Ω~(-1) cm~(-1), sheet resistance of 4.4 Ω/⇔ (p = 3.14×l0~(-4) Ωcm) with over 80% average normal transmittance between the 400 and 800 nm wavelength range. The best FTO film consists of a large distribution of grain sizes from 50 nm to 400 nm range and the optimum conditions used are 0.1 M DBTDA, 0.3 M ammonium fluoride, in a mixture of propan-2-ol and water, at 470 ℃ substrate temperature. The large distribution of grain sizes can be easily obtained using low DBTDA concentration (~0.1 M or less) and moderate substrate temperature (470 ℃).
机译:通过改变溶液中的F-浓度,使用二乙酸二正丁基锡(iv)(0.1 M DBTDA)的稀前驱体溶液,在不同的基板温度下制备氟掺杂的氧化锡(FTO)薄膜。注意到通过增加溶液中的氟量,FTO膜的电导率增加。 SEM图像的形态表明,晶粒尺寸及其分布完全受电导率改变的衬底温度的影响。在这些FTO薄膜中,获得的最佳薄膜的电子电导率为31.85x10〜2Ω〜(-1)cm〜(-1),薄层电阻为4.4Ω/⇔(p = 3.14×l0〜(-4)Ωcm )在400至800 nm波长范围内的平均法向透射率超过80%。最佳的FTO薄膜由50 nm至400 nm范围内的较大晶粒分布组成,在470℃的底物上使用的最佳条件是0.1 M DBTDA,0.3 M氟化铵(在丙-2-醇和水的混合物中)温度。使用较低的DBTDA浓度(约0.1 M或更低)和适中的衬底温度(470℃)可以轻松获得较大的晶粒尺寸分布。

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