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首页> 外文期刊>Thin Solid Films >Structure and dielectric properties of sputtered bismuth magnesium niobate thin films
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Structure and dielectric properties of sputtered bismuth magnesium niobate thin films

机译:溅射铌酸铋镁薄膜的结构和介电性能

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摘要

The Bi_(1.5)MgNb_(1.5)O_7 (BMN) thin films were prepared on platinum coated sapphire by rf magnetron sputter deposition. Effects of substrate temperature, sputter pressure and O_2/(O_2 + Ar) mixing ratio on phase structures and dielectric properties of thin films were investigated. The results indicated that sufficiently high substrate temperature and low sputter pressure would facilitate the formation of cubic pyrochlore in BMN thin films. Meanwhile, the appropriate O_2/(O_2 + Ar) mixing ratio of sputter atmosphere was required. The deposited Bi_(1.5)MgNb_(1.5)O_7 cubic pyrochlore thin films with (222) oriented texture exhibited large tunability of-50% at a maximum applied bias field of 1.5 MV/cm, with low dielectric loss of -0.007. The temperature and frequency dependent dielectric measurements indicated that no noticeable dielectric dispersion was detected in BMN cubic pyrochlore thin films.
机译:通过射频磁控溅射沉积在涂铂的蓝宝石上制备Bi_(1.5)MgNb_(1.5)O_7(BMN)薄膜。研究了衬底温度,溅射压力和O_2 /(O_2 + Ar)混合比对薄膜相结构和介电性能的影响。结果表明,足够高的基板温度和较低的溅射压力将促进BMN薄膜中立方烧绿石的形成。同时,需要适当的溅射气氛的O_2 /(O_2 + Ar)混合比。沉积的具有(222)取向织构的Bi_(1.5)MgNb_(1.5)O_7立方烧绿石薄膜在最大施加偏压场为1.5 MV / cm时表现出-50%的大可调谐性,且介电损耗低至-0.007。温度和频率相关的介电测量结果表明,在BMN立方烧绿石薄膜中未检测到明显的介电色散。

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  • 来源
    《Thin Solid Films》 |2012年第19期|p.6295-6298|共4页
  • 作者单位

    State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    cubic pyrochlore films; Bi1.5MgNb_(1.5)O_7 thin films; tunability; dielectric dispersion; sputter deposition; low loss tangent;

    机译:立方烧绿石薄膜;Bi1.5MgNb_(1.5)O_7薄膜;可调性介电色散溅射沉积低损耗正切;

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