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机译:溅射铌酸铋镁薄膜的结构和介电性能
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;
cubic pyrochlore films; Bi1.5MgNb_(1.5)O_7 thin films; tunability; dielectric dispersion; sputter deposition; low loss tangent;
机译:溅射压力对射频磁控溅射制备铌酸铋镁薄膜结构和介电性能的影响
机译:衬底对射频磁控溅射制备铌酸铋镁薄膜介电性能的影响
机译:界面结构对铌酸镁薄膜镁镁镁镁镁的微观结构和介电性能的影响
机译:O_2 / AR对RF磁控溅射制备的铋锌铌酸盐钛薄膜介电性能的影响
机译:掺杂和不掺杂铌酸铅铟:铌酸镁铅的温度稳定性得到改善的高介电常数陶瓷和薄膜的研究
机译:退火对溅射生长铋钛氧化物薄膜结构和光学性能的影响
机译:生长条件对铌酸铋镁薄膜结构和介电性能的影响