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机译:不同氧分压下氧化钇稳定氧化锆薄膜的表面改性
Busan Center, Korea Basic Science Institute, Busan 609-735, Republic of Korea;
Department of Physics, Pusan National University, Busan 609-735, Republic of Korea;
Department of Applied Physics, Hanyang University, ERICA Ansan 426-791, Republic of Korea;
Department of Physics, Pusan National University, Busan 609-735, Republic of Korea;
Department of Physics, Pusan National University, Busan 609-735, Republic of Korea;
National Core Research Center for Extreme Light Applications, Cwangju Institute Science & Technology, Cwangju 500-712, Republic of Korea;
Chonnam National University, Yeosu 550-749, Republic of Korea;
Research Center for Dielectric & Advanced Matter, Pusan National University, Busan 609-735, Republic of Korea;
Research Center for Dielectric & Advanced Matter, Pusan National University, Busan 609-735, Republic of Korea;
Jeunju Center, Korea Basic Science Institute, Jeonju 567-756, Republic of Korea;
Busan Center, Korea Basic Science Institute, Busan 609-735, Republic of Korea;
Department of Cogno-mechatronics Engineering, Pusan National University, Miryang 627-706, Republic of Korea;
Department of Physics, Pusan National University, Busan 609-735, Republic of Korea,Department of Physics, Sungkyunkwan University, Suwon, Cyeonggi-do 440-746, Republic of Korea;
Department of Physics, Pusan National University, Busan 609-735, Republic of Korea;
oxide thin films; X-ray diffraction; spectroscopy; surface structure; optical band-gap;
机译:La_(0.7)sr_(0.3)mno_3薄膜中锶表面偏析的原位表征与氧分压的关系
机译:IBS在YBCO薄膜沉积中a-c相比,结晶度,表面粗糙度和面内取向的氧分压依赖性
机译:通过改变脉冲激光沉积制备的氧氮化铬薄膜中的氧分压来控制氧含量
机译:在各种氧气部分压力下通过脉冲激光沉积制备的Pt(111)/ Ti / SiO_2 / Si衬底上BifeO_3薄膜的结构和性质
机译:氧化物表面和金属氧化物界面的反应性:水蒸气压力对超薄氧化铝膜的影响,以及铂在超薄氧化膜上的生长模式及其对粘附力的影响的研究。
机译:衬底温度和氧分压对脉冲激光沉积生长纳米晶铜氧化物薄膜性能的影响
机译:脉冲激光沉积Bi2O3:HO3 +薄膜晶体结构对晶体结构,形态学和发光性能的影响:HO3 +薄膜
机译:薄膜氧分压传感器