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Evolution of the properties of ZnO thin films subjected to heating treatments

机译:热处理后ZnO薄膜的性能演变

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摘要

Structural and optical properties of ZnO thin films (200 nm thickness) deposited using magnetron sputtering technique are influenced by structural defects. Therefore, we applied various heating treatments in order to control and improve the crystallinity of the samples. These treatments were realized in air at temperatures of 350℃, 550℃ and 700℃ respectively, each for a duration of 1 h. The properties of the samples were investigated both before and after the heating treatment. Modern methods like X-ray Diffraction, Atomic Force Microscopy and Scanning Electron Microscopy were used to analyze the structure and morphology of the heated ZnO thin films. These heating treatments may be held responsible for rearrangements in the morphology of the thin films. Thus, it was observed that an increase of porosity and agglomeration of the crystallites is followed by an increase in the size of the crystallites. Inter-crystalline borders will migrate determining a coalescence of several crystallites during the heating process, as well. As a consequence, an increase of the band gap width from 3.26 eV to 3.30 eV (at 350℃) and 3.32 eV (at 550℃) respectively, occurred.
机译:使用磁控溅射技术沉积的ZnO薄膜(厚度为200 nm)的结构和光学特性受结构缺陷的影响。因此,我们进行了各种热处理,以控制和改善样品的结晶度。这些处理分别在温度分别为350℃,550℃和700℃的空气中进行,每次持续1 h。在热处理之前和之后都研究了样品的性能。 X射线衍射,原子力显微镜和扫描电子显微镜等现代方法被用来分析加热的ZnO薄膜的结构和形态。这些热处理可以被认为是导致薄膜形态重新排列的原因。因此,观察到,微孔的孔隙率和附聚度的增加随后是微晶尺寸的增加。晶间边界也将迁移,从而决定了加热过程中多个微晶的结合。结果,带隙宽度分别从3.26 eV增加到3.30 eV(在350℃)和3.32 eV(在550℃)。

著录项

  • 来源
    《Thin Solid Films》 |2012年第14期|p.4689-4693|共5页
  • 作者单位

    National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Street, PO Box MC-36, Magurele 077125, Ilfov, Romania;

    National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Street, PO Box MC-36, Magurele 077125, Ilfov, Romania;

    National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Street, PO Box MC-36, Magurele 077125, Ilfov, Romania;

    National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Street, PO Box MC-36, Magurele 077125, Ilfov, Romania;

    National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Street, PO Box MC-36, Magurele 077125, Ilfov, Romania;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    thin films; zinc oxide; magnetron sputtering; heating treatments; structural properties; transparent films;

    机译:薄膜;氧化锌磁控溅射;加热处理;结构特性透明膜;

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