机译:热处理后ZnO薄膜的性能演变
National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Street, PO Box MC-36, Magurele 077125, Ilfov, Romania;
National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Street, PO Box MC-36, Magurele 077125, Ilfov, Romania;
National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Street, PO Box MC-36, Magurele 077125, Ilfov, Romania;
National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Street, PO Box MC-36, Magurele 077125, Ilfov, Romania;
National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Street, PO Box MC-36, Magurele 077125, Ilfov, Romania;
thin films; zinc oxide; magnetron sputtering; heating treatments; structural properties; transparent films;
机译:基板加热和膜厚对银基Zno多层薄膜性能的影响
机译:通过在非晶SiO2衬底和单晶GaSe薄片上热处理Zn薄膜获得的ZnO薄膜的光学特性
机译:预热温度对溶胶-凝胶旋涂法制备ZnO薄膜微结构和光学性能的影响
机译:基材加热和薄膜厚度对银基ZnO多层薄膜性能的影响
机译:同步加速器X射线光谱和成像研究了ZnO薄膜和钢表面的表面形态和化学演变。
机译:印刷微加热器在基板上的焦耳效应加热制备ZnO半导体薄膜
机译:浓度和后加热对ZnO薄膜的晶体尺寸和光学性能的影响