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机译:通过低温减压化学气相沉积获得高应变嵌入SiGe
IBM at Albany Nanotec, 257 Fuller Road, Albany. NY 12203, USA;
Matheson, 257 Fuller Road, Albany, NY12203, USA;
Matheson, 257 Fuller Road, Albany, NY12203, USA;
Matheson, 257 Fuller Road, Albany, NY12203, USA;
IBM at Albany Nanotec, 257 Fuller Road, Albany. NY 12203, USA;
IBM at Albany Nanotec, 257 Fuller Road, Albany. NY 12203, USA;
IBM Research, 1101 Kitchawan Road, Yorktown, NY 10598, USA;
Matheson, 257 Fuller Road, Albany, NY12203, USA;
Matheson, 257 Fuller Road, Albany, NY12203, USA;
SiGe; selective; RPCVD; epitaxy; strained-silicon; stressors; HCl; low-temperature;
机译:低温减压化学气相沉积硅基外延层中Si(100)上气相颗粒的形成和消除
机译:通过使用二氯硅烷,硅烷和三硅烷的减压化学气相沉积法实现低温Si同质外延
机译:减压化学气相沉积中高Ge含量SiGe的低温生长动力学
机译:利用SiCl_2H_2 / GeH_4前驱体减压化学气相沉积法制备高Ge含量的低温SiGe层
机译:低压化学气相沉积反应器中硅的低温原子层外延。
机译:在环境压力下通过化学气相沉积法从苯上低温生长的连续石墨烯薄膜
机译:各种材料表面上碳化硅的室温和减压化学气相沉积
机译:沉积低应变LpCVD(低压,化学气相沉积)多晶硅