机译:金属有机化学气相沉积法在立方织构镍上外延生长CdTe薄膜
Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, NY, 12180-3590, USA;
Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, NY, 12180-3590, USA;
Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY, 12180-3590, USA;
Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, NY, 12180-3590, USA;
Oak Ridge National Lab, Oak ridge, TN, 37831-6116, USA;
US Army ARDEC Benet Labs, Watervliet, NY, 12189-4050, USA;
Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, NY, 12180-3590, USA;
Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, NY, 12180-3590, USA;
Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, NY, 12180-3590, USA;
epitaxy; cadmium telluride; cube-textured nickel; metal organic chemical vapor deposition; X-ray pole figures; electron backscattered diffraction; oriented domains;
机译:金属有机化学气相沉积法制备厚度小于100 nm的外延BaTiO_3薄膜
机译:金属有机化学气相沉积法在MgO(110)衬底上外延生长Ga_2O_3薄膜
机译:外延BaTiO_3薄膜的快速热两步金属有机化学气相沉积生长
机译:液体输送金属有机化学气相沉积法生长(Ni,Zn)Fe_2O_4薄膜
机译:通过固体源金属有机化学气相沉积法生长的外延氧化物薄膜。
机译:金属有机化学气相沉积法在Ni(111)上高质量地生长六方氮化硼的晶片规模和选择性区域
机译:外延(111)Cu,Ni和CuxNiy薄膜在α-al2O3(0001)上通过化学气相沉积生长石墨烯
机译:衬底对金属有机化学气相沉积制备的外延pbTiO(sub 3)薄膜的结构和光学性质的影响