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首页> 外文期刊>Thin Solid Films >Microstructure and electrochemical corrosion behavior of Cr-Ni-Fe alloy deposits electroplated in the presence of trivalent Cr ions
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Microstructure and electrochemical corrosion behavior of Cr-Ni-Fe alloy deposits electroplated in the presence of trivalent Cr ions

机译:三价Cr离子存在下电镀的Cr-Ni-Fe合金镀层的组织和电化学腐蚀行为

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摘要

Cr-Ni-Fe alloy deposits containing different Cr, Ni and Fe contents were created by varying the electroplating current density in an eco-friendly trivalent Cr-based bath with Ni~(2+) and Fe~(2+) ions. The Cr content of the Cr-Ni-Fe alloy deposits increased from 14 to 75 wt% when the electroplating current density changed from 15 to 25 A/dm~2. The mapping result obtained with a scanning electron microscope showed that a uniform ternary Cr-Ni-Fe alloy deposit could be obtained from the proposed bath, and X-ray diffraction results indicated the Fe-based alloy electroplated at 15 A/dm~2 was crystalline, whereas the Cr-based alloy deposits electroplated at a high current density had an amorphous structure. The electrochemical corrosion test results showed that the corrosion resistance of the Cr-Ni-Fe alloy deposit electroplated at 20 A/dm~2 was better than that of the Cr-Ni-Fe alloy deposit obtained at 25 A/dm~2, despite having almost identical chemical compositions. These results were obtained by performing an electrochemical test and microstructure observations.
机译:通过在具有Ni〜(2+)和Fe〜(2+)离子的生态友好型三价Cr基镀液中改变电镀电流密度,创建了包含不同Cr,Ni和Fe含量的Cr-Ni-Fe合金镀层。当电镀电流密度从15 A / dm〜2改变为25 A / dm〜2时,Cr-Ni-Fe合金沉积物中的Cr含量从14 wt%增加到75 wt%。用扫描电子显微镜得到的标测结果表明,从所建议的镀液中可以获得均匀的三元Cr-Ni-Fe合金沉积物,X射线衍射结果表明以15 A / dm〜2的速度电镀的Fe基合金为晶体,而以高电流密度电镀的Cr基合金沉积物具有非晶态结构。电化学腐蚀测试结果表明,尽管镀层在20 A / dm〜2的条件下进行了电镀,但其耐蚀性优于在25 A / dm〜2的条件下获得的Cr-Ni-Fe合金的镀层。具有几乎相同的化学组成。这些结果是通过进行电化学测试和微观结构观察获得的。

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