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Preparation of Na delta-doped p-type ZnO thin films by pulsed laser deposition using NaF and ZnO ceramic targets

机译:利用NaF和ZnO陶瓷靶材进行脉冲激光沉积制备掺Na的p型ZnO薄膜。

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摘要

Na δ-doped p-type ZnO thin films were fabricated on quartz substrates with the structure of ZnO/Na (δ-layer) multi-layers by pulsed laser deposition. NaF ceramic target was used as Na source. The effects of oxygen pressure and substrate temperature on the electrical properties of Na 5-doped ZnO thin films are discussed. An optimized result with a resistivity of 29.8Ω • cm, Hall mobility of 0.263 cm~2/V • s, and hole concentration of 7.9 × 10~(17) cm~(-3) is achieved, and electrically stable over several months. The present work is of interest for developing a method to realize p-type ZnO thin films doping with Na.
机译:通过脉冲激光沉积,在具有ZnO / Na(δ层)多层结构的石英衬底上制备了Naδ掺杂的p型ZnO薄膜。 NaF陶瓷靶用作Na源。讨论了氧气压力和衬底温度对Na 5掺杂的ZnO薄膜电学性能的影响。获得了优化的结果,其电阻率为29.8Ω•cm,霍尔迁移率为0.263 cm〜2 / V•s,空穴浓度为7.9×10〜(17)cm〜(-3),并且在几个月内保持电稳定。当前的工作对于开发一种实现掺杂有Na的p型ZnO薄膜的方法感兴趣。

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  • 来源
    《Thin Solid Films》 |2013年第1期|53-57|共5页
  • 作者单位

    State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, People's Republic of China;

    State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, People's Republic of China;

    State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, People's Republic of China;

    State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, People's Republic of China;

    State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, People's Republic of China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Characterization; p-Type conduction; Pulsed laser deposition; Zinc compounds; Semiconducting materials;

    机译:表征;p型传导;脉冲激光沉积锌化合物;半导体材料;

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