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Stabilization of tetragonal/cubic phase in Fe doped zirconia grown by atomic layer deposition

机译:原子层沉积法生长的掺铁氧化锆中四方/立方相的稳定性

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In this work we investigated the effect of Fe doping on structural properties of ZrO2 grown by atomic layer deposition (ALD) using Zr(TMHD)_4 for Zr and Fe(TMHD)_3 for Fe precursors (TMHD=2,2,6,6-tetramethyl-3, 5-heptanedionate) and ozone as oxygen source. The temperature during the growth process was fixed at 350 °C The ALD process was tuned to obtain Fe-doped ZrO_2 films with uniform chemical composition, as seen by the time of flight secondary ion mass spectrometry. The control of Fe content was effectively reached, by controlling the ALD precursor pulse ratio, as checked by X-ray photoemission spectroscopy (XPS) and spectro-scopic ellipsometry. From XPS, Fe was found in Fe~(3+) chemical state, which maximizes the magnetization per atom. We also found, by grazing incidence X-ray diffraction, that the inclusion of Fe impurities in ZrO_2 induces amorphization in thin ZrO_2 films, while it stabilizes the high temperature crystalline tetragonal/cubic phase after rapid thermal annealing at 600 ℃.
机译:在这项工作中,我们研究了Fe掺杂对原子层沉积(ALD)使用Zr(TMHD)_4的Zr和Fe(TMHD)_3的Fe前驱物(TMHD = 2,2,6,6)生长的ZrO2的结构性能的影响-四甲基-3,5-庚二酸酯)和臭氧作为氧源。生长过程中的温度固定在350°C。调整了ALD过程,以得到具有均匀化学成分的掺铁ZrO_2膜,如通过飞行二次离子质谱法所见。通过控制ALD前驱体脉冲比可以有效地达到对Fe含量的控制,如通过X射线光电子能谱(XPS)和椭圆偏振光谱法所检查的那样。在XPS中,发现Fe处于Fe〜(3+)化学态,这使每个原子的磁化强度最大化。通过掠射X射线衍射,我们还发现ZrO_2中包含Fe杂质会引起ZrO_2薄膜中的非晶化,同时在600℃的快速热退火后能稳定高温结晶四方/立方相。

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