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Analysis of optical band-gap shift in impurity doped ZnO thin films by using nonparabolic conduction band parameters

机译:利用非抛物线导带参数分析掺杂ZnO薄膜的光学带隙位移

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摘要

Polycrystalline ZnO thin films both undoped and doped with various types of impurities, which covered the wide carrier concentration range of 10~(16)-l0~(21) cm~(-3), were prepared by magnetron sputtering, and their optical-band gaps were investigated. The experimentally measured optical band-gap shifts were analyzed by taking into account the carrier density dependent effective mass determined by the first-order nonparabolicity approximation. It was shown that the measured shifts in optical band-gaps in ZnO films doped with cationic dopants, which mainly perturb the conduction band, could be well represented by theoretical estimation in which the band-gap widening due to the band-filling effect and the band-gap renormalization due to the many-body effect derived for a weakly interacting electron-gas model were combined and the carrier density dependent effective mass was incorporated.
机译:用磁控溅射制备了不掺杂和掺杂各种杂质的多晶ZnO薄膜,它们覆盖了10〜(16)-l0〜(21)cm〜(-3)的宽载流子浓度范围,并对其光学特性进行了研究。带隙进行了研究。通过考虑由一阶非抛物线近似确定的取决于载流子密度的有效质量来分析实验测量的光学带隙位移。结果表明,用阳离子掺杂剂掺杂的ZnO薄膜中的光学带隙的测量位移(主要扰动导带)可以通过理论估计很好地表示,其中由于带填充效应和带隙效应,带隙变宽。归因于弱相互作用电子-气体模型的多体效应所产生的带隙重归一化,并结合了载流子密度相关有效质量。

著录项

  • 来源
    《Thin Solid Films》 |2013年第15期|430-435|共6页
  • 作者单位

    Electronic Materials Research Center, Korea Institute of Science and Technology, 14-gil 5, Hwarang-ro, Seongbuk-gu, Seoul 136-791, Republic of Korea;

    Electronic Materials Research Center, Korea Institute of Science and Technology, 14-gil 5, Hwarang-ro, Seongbuk-gu, Seoul 136-791, Republic of Korea Division of Materials Science and Engineering Korea University, Anam-Dong 5-7, Sungbuk-gu, Seoul 136-701, Republic of Korea;

    Photo-electronic Hybrids Research Center, Korea Institute of Science and Technology, 14-gil 5, Hwarang-ro, Seongbuk-gu, Seoul 136-791, Republic of Korea;

    Electronic Materials Research Center, Korea Institute of Science and Technology, 14-gil 5, Hwarang-ro, Seongbuk-gu, Seoul 136-791, Republic of Korea;

    Electronic Materials Research Center, Korea Institute of Science and Technology, 14-gil 5, Hwarang-ro, Seongbuk-gu, Seoul 136-791, Republic of Korea;

    Division of Materials Science and Engineering Korea University, Anam-Dong 5-7, Sungbuk-gu, Seoul 136-701, Republic of Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    zno thin film; optical band-gap; nonparabolicity;

    机译:锌薄膜光学带隙非抛物线;

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