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Characterization of InGaN-based photovoltaic devices by varying the indium contents

机译:通过改变铟含量表征InGaN基光伏器件

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摘要

InGaN-based photovoltaic structures with different indium contents in InGaN active layer were investigated. The peak wavelengths of the photoluminescence (PL) spectra were measured at 464.3 nm and 525.4 nm for the blue-photovoltaic device (B-PV) and the green-photovoltaic device (G-PV) structures, respectively. The flat-band voltage was observed at - 8 V through the lower temperature (10 K) bias-dependent PL measurement in B-PV device, but the flat-band voltage cannot be observed in G-PV device when the reverse bias was larger than -15 V. The piezoelectric field (PZ) of the G-PV device was larger than the B-PV device through the bias-dependent PL measurement that was caused by the large lattice mismatch between the GaN and InGaN layers with high indium content. The small open-circuit voltage and the larger short-circuit current density (J_(sc)) were measured in the G-PV device compared with the B-PV device. The large J_(sc) value of the G-PV device was caused by the large photocurrent escaped from the PZ-field induced tilted-band structure in InGaN active layer. The InGaN-based PV devices with a large indium content and a lager PZ field had potential for the InGaN photovoltaic device applications.
机译:研究了InGaN有源层中具有不同铟含量的InGaN基光伏结构。对于蓝色光伏器件(B-PV)和绿色光伏器件(G-PV)结构,分别在464.3 nm和525.4 nm处测量了光致发光(PL)光谱的峰值波长。通过B-PV器件的较低温度(10 K)偏置相关的PL测量,在-8 V处观察到了平带电压,但是当反向偏置较大时,在G-PV器件中无法观察到平带电压高于-15V。通过偏置相关的PL测量,G-PV器件的压电场(PZ)大于B-PV器件,这是由铟含量高的GaN和InGaN层之间的晶格失配引起的。与B-PV装置相比,在G-PV装置中测得的开路电压小且短路电流密度(J_(sc))大。 G-PV器件的大J_(sc)值是由InGaN有源层中从PZ场感应的倾斜带结构逸出的大光电流引起的。铟含量高且PZ场大的基于InGaN的PV器件具有用于InGaN光伏器件的潜力。

著录项

  • 来源
    《Thin Solid Films 》 |2013年第1期| 278-281| 共4页
  • 作者单位

    Department of Materials Science and Engineering, National Chung Hsing University, Taichung 402, Taiwan, ROC;

    Department of Materials Science and Engineering, National Chung Hsing University, Taichung 402, Taiwan, ROC;

    Department of Materials Science and Engineering, National Chung Hsing University, Taichung 402, Taiwan, ROC;

    Department of Materials Science and Engineering, National Chung Hsing University, Taichung 402, Taiwan, ROC;

    Department of Materials Science and Engineering, National Chung Hsing University, Taichung 402, Taiwan, ROC;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    InGaN; photovoltaic device; piezoelectric field;

    机译:氮化镓;光伏设备压电场;

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