机译:大气压等离子体增强化学气相沉积在低温下合成的氢化非晶碳基薄膜的硬度和表面粗糙度
Center for Science of Environment, Resources and Energy, Graduate School of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan;
Center for Science of Environment, Resources and Energy, Graduate School of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan;
Korea Institute of Science and Technology, Hwarang-no 14-gil 5, Seongbuk-gu, Seoul 136-791, Republic of Korea;
Center for Science of Environment, Resources and Energy, Graduate School of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan;
Center for Science of Environment, Resources and Energy, Graduate School of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan;
hydrogenated amorphous carbon; thin films; atmospheric pressure plasma-enhanced; chemical vapor deposition; surface roughness; dilution gas; low temperature;
机译:大气压等离子体增强CVD法合成不同脉冲频率的氢化非晶碳膜的硬度和表面粗糙度
机译:低温等离子体化学气相沉积法生长非晶硅膜表面粗糙度演变的实验和理论研究
机译:大气压等离子体化学气相沉积合成非晶碳膜的耐候性
机译:原位等离子体分析,通过等离子体增强化学气相沉积法沉积在Si上的氟化非晶碳和氢化非晶碳薄膜的氟掺入,热稳定性,应力和硬度比较
机译:一种在大气压下化学气相沉积制备氢化非晶硅薄膜的简单方法。
机译:N2:(N2 + CH4)比在低温等离子体增强化学气相沉积法生长疏水纳米结构氢化氮化碳薄膜中的作用研究
机译:由大气压等离子体增强的化学气相沉积合成的非晶碳膜的耐候性
机译:低温大气压化学气相沉积第14族氧化膜