机译:使用无缓冲层的低能离子束溅射沉积从外延Fe / Pt多层结构到有序FePt膜的结构转变
Department of Engineering and System Science, National Tsing Hua University, Hsinchu 30013, Taiwan;
Department of Engineering and System Science, National Tsing Hua University, Hsinchu 30013, Taiwan,Electronics and Optoelectronics Research Laboratories, Industrial Technology Research Institute, Hsinchu 31040, Taiwan;
Department of Engineering and System Science, National Tsing Hua University, Hsinchu 30013, Taiwan;
Department of Physics, National Cheng Kung University, Tainan 70101, Taiwan;
X-ray diffraction; FePt; Epitaxial structure; Perpendicular magnetic anisotropy; Ion beam sputtering;
机译:外延Fe_3O_4:Zn0多层膜通过离子束溅射沉积制备Zn铁氧体外延薄膜
机译:ITO缓冲层对脉冲激光沉积技术制备的ZnO多层薄膜的结构,光学和电学性质的影响
机译:通过[FePt / C] _5 / Fe / [C / FePt] _5多层沉积和后退火制备的渐变/软/渐变交换耦合薄膜
机译:单原子层沉积(FePt)_(1-x)Cux薄膜和Pt顶层沉积的FePt薄膜的结构研究
机译:一种统计方法,用于优化电沉积硫化铟(III)(In2S3)膜的参数,这是光伏应用中潜在的低危害缓冲层。
机译:在大晶格失配中间层上外延生长的柱状结构FePt膜
机译:通过离子辅助溅射沉积从多层生长的高度有序的外延孔薄膜的增强轨道磁矩
机译:使用低能量(10-500 EV)离子束沉积系统在低温下直接形成薄膜和外延叠层