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机译:应变铁电NaNbO_3薄膜:脉冲激光沉积生长条件对结构性能的影响
Leibniz-Institute for Crystal Growth, Max-Born-Str. 2, D-12489 Berlin, Germany;
Leibniz-Institute for Crystal Growth, Max-Born-Str. 2, D-12489 Berlin, Germany;
Leibniz-Institute for Crystal Growth, Max-Born-Str. 2, D-12489 Berlin, Germany;
Leibniz-Institute for Crystal Growth, Max-Born-Str. 2, D-12489 Berlin, Germany;
Leibniz-Institute for Crystal Growth, Max-Born-Str. 2, D-12489 Berlin, Germany;
Leibniz-Institute for Crystal Growth, Max-Born-Str. 2, D-12489 Berlin, Germany;
Pulsed laser deposition; Sodium niobate; Stoichiometry; Structural properties; Piezoresponse force microscopy; Ferroelectric domains; Strain; Thin films;
机译:NaNbO_3缓冲层的脉冲激光沉积沉积在Pt /(001)MgO衬底上的(Na_(0.5)K_(0.5))NbO_3基薄膜的铁电性能
机译:铁电NaNbO_3薄膜的脉冲激光沉积
机译:铁电随机存取存储器通过脉冲激光沉积生长的(Bi,Ce)_4Ti_3O_(12)薄膜的结构和铁电性能
机译:通过脉冲激光沉积和铁电特性的生长和天然超晶格结构的Bi {Sub} 4Ti {Sub} 3o {sub} 12-srbi {sub} 4ti {sub} 4o {sub} 15和bi {sub} 3Tinbo {sub} 9-bi {sub} 4ti {sub} 3o {sub} 12
机译:脉冲激光沉积制备的铁电锶(0.16)钡(0.39)铌酸盐薄膜的微波特性。
机译:衬底温度和氧分压对脉冲激光沉积生长纳米晶铜氧化物薄膜性能的影响
机译:YBA2Cu3O7-X超导薄膜的脉冲激光沉积:制备条件与结构和电性能之间的相关性