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Strained ferroelectric NaNbO_3 thin films: Impact of pulsed laser deposition growth conditions on structural properties

机译:应变铁电NaNbO_3薄膜:脉冲激光沉积生长条件对结构性能的影响

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摘要

Pulsed laser deposition (PLD) was employed to grow coherent NaNbO_3 thin films on several lattice matched substrates. Compressive (tensile) lattice strain was induced by the use of NdGaO_3 and SrTiO_3 (DyScO_3 and TbScO_3) single crystals. Deposition from a stoichiometric target at a 5 Pa O_2 pressure was found to result in sodium and oxygen deficient films. By increasing the oxygen background pressure up to 200 Pa the oxygen and sodium concentrations in films on all substrates could be increased. As an alternative way to enhance the compositional ordering in the films sodium excess ceramics were used as PLD targets. With a Na/Nb ratio up to 1.17, phase pure, well-ordered films with smooth surfaces were grown on all substrates. The film composition was found to have a crucial impact on the formation of ferroelectric domains in tensilely strained films on DyScO_3 substrates. Regularly arranged ferroelectric stripe domains were obtained at an oxygen partial pressure of 5 Pa using sodium rich growth parameters via the application of a 1.17 Na/Nb ratio PLD target.
机译:脉冲激光沉积(PLD)用于在几个晶格匹配的衬底上生长相干的NaNbO_3薄膜。通过使用NdGaO_3和SrTiO_3(DyScO_3和TbScO_3)单晶来诱发压缩(拉伸)晶格应变。发现在5 Pa O_2压力下从化学计量目标进行沉积会形成钠和氧不足的薄膜。通过将氧气本底压力提高到200 Pa,可以提高所有基材上薄膜中的氧气和钠浓度。作为增强膜中成分顺序的另一种方法,将过量的钠陶瓷用作PLD靶。当Na / Nb比例高达1.17时,在所有基板上均会生长出具有平滑表面的相纯,排列整齐的薄膜。发现该膜组成对在DyScO_3衬底上的拉伸应变膜中铁电畴的形成具有至关重要的影响。通过使用1.17 Na / Nb比PLD靶,使用富钠生长参数,在5 Pa的氧分压下,获得规则排列的铁电带状磁畴。

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