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Properties of pentacene-based films prepared using a heated tungsten mesh

机译:使用加热的钨网制备并五苯类薄膜的性能

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摘要

A heated tungsten (W) mesh, set between a pentacene source and a substrate in a vacuum chamber, was used to prepare a bulk-phase pentacene film and a pentacene-based organic semiconductor film. Since the pentacene molecules come into contact with the heated W mesh before reaching the substrate, their thermal energy is increased prior to deposition. As the mesh temperature was increased from 23 to 1200 ℃, the intensity ratio of bulk to thin-film phases increased from 0 to 9.7. Above 1300 ℃ there is a notable decomposition reaction, the products of which were identified as dihydropentacene, p-distrylbenzene, and 2,2'-dimethyl-1,1'-binaphthalene. These decomposed precursors are expected to provide a potential source of large graphene sheets and graphene nanoribbons.
机译:使用设置在并五苯源与真空室中的基板之间的加热的钨(W)网来制备体相并五苯膜和并五苯基有机半导体膜。由于并五苯分子在到达基底之前已与加热的W网孔接触,因此在沉积之前会增加其热能。随着筛孔温度从23℃增加到1200℃,体相与薄膜相的强度比从0增加到9.7。在1300℃以上有明显的分解反应,其产物被鉴定为二氢并五苯,对-二甲苯苯和2,2'-二甲基-1,1'-联萘。预期这些分解的前体将提供大的石墨烯片和石墨烯纳米带的潜在来源。

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