首页> 外文期刊>Thin Solid Films >Room-temperature electrical creation of spin accumulation in n-Ge using highly resistive Fe_3Si~+-Ge Schottky-tunnel contacts
【24h】

Room-temperature electrical creation of spin accumulation in n-Ge using highly resistive Fe_3Si~+-Ge Schottky-tunnel contacts

机译:使用高电阻Fe_3Si / n〜+ -Ge肖特基隧道接触在n-Ge中室温自旋累积产生电

获取原文
获取原文并翻译 | 示例
           

摘要

We have explored an effect of the interface resistance of Fe_3Si~+-Ge Schottky-tunnel contacts on spin accumulation created electrically in n-Ge. Using the Schottky-tunnel contacts with a relatively high interface resistance, we can clearly detect spin-accumulation signals in n-Ge even at room temperature, meaning that the use of highly resistive Schottky tunnel contacts is effective to electrically create large spin accumulation. Since such highly resistive source and drain electrodes are not available for next-generation Ge-based spintronic applications with ultra-low power consumption, the development of highly spin-polarized spin injectors such as half-metallic materials is essential from now on.
机译:我们已经研究了Fe_3Si / n〜+ -Ge肖特基隧道接触点的界面电阻对在n-Ge中电产生的自旋累积的影响。使用具有较高接口电阻的肖特基隧道接触,即使在室温下,我们也可以清楚地检测n-Ge中的自旋积累信号,这意味着使用高电阻肖特基隧道接触可以有效地产生较大的自旋积累。由于这种高电阻的源电极和漏电极不适用于具有超低功耗的下一代基于Ge的自旋电子学应用,因此从现在起开发高自旋极化自旋注入器(例如半金属材料)至关重要。

著录项

  • 来源
    《Thin Solid Films》 |2014年第30期|382-385|共4页
  • 作者单位

    Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan;

    Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan;

    Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan;

    Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan;

    Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan;

    Advanced Research Laboratories, Tokyo City University, 8-75-1 Todoroki, Tokyo 758-0082, Japan;

    Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan,CREST, Japan Science and Technology Agency, Gobancho, Tokyo 102-0076, Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Germanium; Spintronics; Molecular beam epitaxy;

    机译:锗;自旋电子学分子束外延;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号