机译:使用高电阻Fe_3Si / n〜+ -Ge肖特基隧道接触在n-Ge中室温自旋累积产生电
Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan;
Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan;
Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan;
Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan;
Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan;
Advanced Research Laboratories, Tokyo City University, 8-75-1 Todoroki, Tokyo 758-0082, Japan;
Department of Electronics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan,CREST, Japan Science and Technology Agency, Gobancho, Tokyo 102-0076, Japan;
Germanium; Spintronics; Molecular beam epitaxy;
机译:低电阻肖特基隧道接触的n-Ge器件中的室温局部磁阻效应
机译:定性研究具有Fe_3Si / n〜+ -Ge肖特基隧道接触的n-Ge基横向器件中与温度有关的自旋信号
机译:使用原子光滑的Fe_3Si / Si(111)触点在硅基器件中室温符号反转自旋累积信号
机译:溅射Mn
机译:低电阻率的锗硅化物接触层形成了用于纳米级CMOS的磷掺杂的硅锗合金源/漏结。
机译:铁磁体/ Ge肖特基隧道接触的自旋吸收效应
机译:铁磁/ Ge肖特基隧道接触的自旋吸收效应