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机译:磁控溅射碳基非晶薄膜的结构和巨磁电阻
School of Materials Science and Engineering, Guilin University of Electronic Technology, Guilin 541004, China,Guangxi Key Laboratory of Information Materials, Guilin University of Electronic Technology, Guilin 541004, China;
School of Materials Science and Engineering, Guilin University of Electronic Technology, Guilin 541004, China,Guangxi Key Laboratory of Information Materials, Guilin University of Electronic Technology, Guilin 541004, China;
School of Materials Science and Engineering, South China University ofTechnology, Guangzhou 510640, China;
School of Materials Science and Engineering, South China University ofTechnology, Guangzhou 510640, China;
School of Materials Science and Engineering, Guilin University of Electronic Technology, Guilin 541004, China,Guangxi Key Laboratory of Information Materials, Guilin University of Electronic Technology, Guilin 541004, China;
School of Materials Science and Engineering, Guilin University of Electronic Technology, Guilin 541004, China,Guangxi Key Laboratory of Information Materials, Guilin University of Electronic Technology, Guilin 541004, China;
Granular films; Magnetoresistance; Magnetron sputtering;
机译:工作压力对高功率脉冲磁控溅射制备的含铝非晶碳膜结构和性能的影响
机译:真空退火对磁控溅射氢化非晶碳膜组织和摩擦学性能的影响
机译:非平衡磁控溅射制备的类石墨无定形碳膜的微观结构,力学和摩擦学性能
机译:射频磁控溅射法制备的Fe-SiO_2颗粒状薄膜的隧道型巨磁电阻
机译:非垂直入射反应磁控溅射制备的金属氮化物(氮化铝,氮化钛,氮化ha)薄膜的织构演变。
机译:前驱体C2H2分数对磁控溅射沉积制备的含Si和Ag的非晶碳复合膜的组织和性能的影响
机译:前体C2H2分数对磁控溅射沉积制备的含有Si和Ag的无定形碳复合膜微结构和性能的影响