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机译:高沸点溶剂旋涂法制备的聚噻吩薄膜的三阶光学敏感性
Department of Physics and Electronics, Osaka Prefecture University, 1-1 Gakuencho, Sakai, Osaka 599-8531, Japan,The Research Institute for Molecular Electronic Devices, Osaka Prefecture University, 1 -1 Gakuen-cho, Sakai, Osaka 599-8531, Japan;
Department of Physics and Electronics, Osaka Prefecture University, 1-1 Gakuencho, Sakai, Osaka 599-8531, Japan;
Department of Physics and Electronics, Osaka Prefecture University, 1-1 Gakuencho, Sakai, Osaka 599-8531, Japan,The Research Institute for Molecular Electronic Devices, Osaka Prefecture University, 1 -1 Gakuen-cho, Sakai, Osaka 599-8531, Japan;
Technology Research Institute of Osaka Prefecture, 2-7-1 Ayumino, Izumi, Osaka 594-1157, Japan;
Department of Physics and Electronics, Osaka Prefecture University, 1-1 Gakuencho, Sakai, Osaka 599-8531, Japan,The Research Institute for Molecular Electronic Devices, Osaka Prefecture University, 1 -1 Gakuen-cho, Sakai, Osaka 599-8531, Japan;
Third-order optical susceptibility; Conjugated polymer; Thin films; High-boiling-point solvent; Electroabsorption;
机译:无水溶剂滴铸法制备聚噻吩薄膜中三阶光学敏感性的增强
机译:溶剂和厚度对通过溶胶-凝胶旋涂工艺制备的ITO薄膜的结构,光学和电性能的影响
机译:微晶尺寸对Rf溅射制备的CdSe嵌入SiO_2玻璃薄膜三阶非线性光学磁化率的影响
机译:PLD制备的Rh:BaTiO_3薄膜的大三阶非线性光学磁化率
机译:溶胶-凝胶法制备过渡金属氧化物薄膜的三阶非线性光学性质的研究
机译:了解旋涂过程中聚噻吩薄膜的固化:旋涂时间和加工助剂的影响
机译:溶剂和厚度对通过溶胶-凝胶旋涂工艺制备的ITO薄膜的结构,光学和电性能的影响