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E-MRS symposium O: 'Synthesis, processing and characterization of nanoscale multifunctional oxide films - Ⅳ' May 27-31, 2013, Strasbourg, France

机译:E-MRS研讨会O:“纳米级多功能氧化物薄膜的合成,加工和表征-Ⅳ”,2013年5月27日至31日,法国斯特拉斯堡

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The 30th anniversary of the 2013 European Materials Research Society (E-MRS) Spring Meeting included 24 parallel symposia, one plenary session, and an exhibition, with over 3300 participants. Following three previous successful symposia (2006, 2009, and 2011), the symposium "Synthesis, processing and characterization of nanoscale multifunctional oxide films - Ⅳ" continued the tradition of an interdisciplinary forum bringing together scientists and engineers involved in various aspects of the synthesis and growth, characterization, device integration and theoretical modeling of oxide thin films, multilayers and nanostructures. Development of oxide-based advanced multifunctional thin films and heterostructures are key factors for the design of new devices contributing to the advancement of science and technology. Notable this year was the number of excellent presentations dedicated to precise control of the growth, synthesis and characterization of a broad variety of oxide thin films, which exhibit unique structural, optical, electrical, magnetic or mechanical properties, for both fundamental and applied research goals. Of particular note was the variety of deposition methods presented and discussed, with an increasing interest in chemically-based fabrication techniques.
机译:2013年欧洲材料研究学会(E-MRS)春季会议30周年包括24场平行专题讨论会,一次全体会议和一次展览,有3300多名参与者。在前三届成功的研讨会(2006年,2009年和2011年)之后,“纳米级多功能氧化物薄膜的合成,加工和表征-Ⅳ”研讨会延续了跨学科论坛的传统,该领域的科学家和工程师聚集在合成和化学的各个方面。氧化物薄膜,多层和纳米结构的生长,表征,器件集成和理论建模。氧化物基高级多功能薄膜和异质结构的开发是有助于科学和技术进步的新器件设计的关键因素。今年值得注意的是,许多演讲都致力于精确控制各种氧化物薄膜的生长,合成和表征,这些氧化物薄膜具有独特的结构,光学,电,磁或机械特性,可用于基础研究和应用研究。特别值得注意的是提出和讨论的各种沉积方法,并且对基于化学的制造技术越来越感兴趣。

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    《Thin Solid Films》 |2014年第28期|1-1|共1页
  • 作者单位

    University of Cambridge, Department of Materials Science & Metallurgy, 27 Charles Babbage Road, Cambridge, CB3 0FS, UK;

    Institut des Sciences Chimiques de Rennes, UMR CNRS 6226, University of Rennes 1, Bat. 10A, Campus de Beaulieu, 35042 Rennes Cedex, France;

    National Institute for Lasers, Plasmas and Radiation Physics, 122, PO Box MG-36, 77125 Bucharest-Magurele, Romania;

    Fondazione Bruno Kessler, Via Sommarive, 18, 38123 Trento, Italy;

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