...
首页> 外文期刊>Thin Solid Films >Spectral broadening due to post-growth annealing of a long-wave InGaAs/GaAs quantum dot infrared photodetector with a quaternary barrier layer
【24h】

Spectral broadening due to post-growth annealing of a long-wave InGaAs/GaAs quantum dot infrared photodetector with a quaternary barrier layer

机译:具有四级势垒层的长波InGaAs / GaAs量子点红外光电探测器的后生长退火引起的光谱展宽

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

We present the effect of post-growth rapid thermal annealing on multilayer, uncoupled In_(0.50)Ga_(0.50)As/GaAs quantum dot infrared photodetectors (QDIPs) with a combination of quaternary In_(0.21)Al_(0.21)Ca_(0.58)As and GaAs capping. Long wave photoresponse (-0.11 eV or 10.2 μm) with narrow spectral width (14%) is obtained from as-grown QDIPs. The spectral width increases to 45% for QDIP annealed at 800 ℃. It is likely that a large inter-diffusion effect because of annealing changes the composition of the quantum dots and capping layer, thus increasing the QDIP spectral width. Dark current as well as noise current is decreased for 650 ℃ annealed QDIP compared to as-grown detector. Passivation of as-grown defect by post growth annealing predicted the improvement of dark current. Such improvement and broadening of characteristics may render such QDIPs suitable for use in broadband infrared imaging applications.
机译:我们提出了生长后快速热退火对多层四元In_(0.21)Al_(0.21)Ca_(0.58)组合的未耦合In_(0.50)Ga_(0.50)As / GaAs量子点红外光电探测器(QDIPs)的影响As和GaAs上限。从生长中的QDIP获得了窄光谱宽度(14%)的长波光响应(-0.11 eV或10.2μm)。在800℃退火的QDIP的光谱宽度增加到45%。由于退火而产生的大的相互扩散效应可能会改变量子点和覆盖层的成分,从而增加QDIP光谱宽度。与成长型探测器相比,退火后的650℃QDIP的暗电流和噪声电流均降低。通过生长后退火钝化生长缺陷可以预测暗电流的改善。特性的这种改进和拓宽可以使这种QDIP适合在宽带红外成像应用中使用。

著录项

  • 来源
    《Thin Solid Films》 |2014年第3期|146-149|共4页
  • 作者单位

    Center for Nanoelectronics, Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai 400076, Maharashtra, India;

    Center for Nanoelectronics, Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai 400076, Maharashtra, India;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Epitaxy; Annealing; Photodetector; Quantum dot;

    机译:外延;退火;光电探测器量子点;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号