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首页> 外文期刊>Thin Solid Films >Defect control in room temperature deposited cadmium sulfide thin films by pulsed laser deposition
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Defect control in room temperature deposited cadmium sulfide thin films by pulsed laser deposition

机译:脉冲沉积激光控制室温沉积硫化镉薄膜的缺陷

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摘要

The control of defects in cadmium sulfide thin films and its impact on the resulting CdS optical and electrical characteristics are studied. Sulfur vacancies and cadmium interstitial concentrations in the CdS films are controlled using the ambient pressure during pulsed laser deposition. CdS film resistivities ranging from 10~(-1) to 10~4 D-cm are achieved. Hall Effect measurements show that the carrier concentration ranges from 10~(19) to 10~(13) cm~(-3) and is responsible for the observed resistivity variation. Hall mobility varies from 2 to 12 cm~2/V-s for the same pressure regime. Although the energy bandgap remains unaffected (-2.42 eV), the optical transmit-tance is reduced due to the increase of defects in the CdS films. Rutherford back scattering spectroscopy shows the dependence of the CdS films stoichiometry with deposition pressure. The presence of CdS defects is attributed to more energetic species reaching the substrate, inducing surface damage in the CdS films during pulsed laser deposition.
机译:研究了硫化镉薄膜中缺陷的控制及其对所得CdS光学和电学特性的影响。使用脉冲激光沉积过程中的环境压力控制CdS膜中的硫空位和镉间隙浓度。 CdS薄膜的电阻率为10〜(-1)到10〜4 D-cm。霍尔效应测量表明,载流子浓度范围为10〜(19)至10〜(13)cm〜(-3),是所观察到的电阻率变化的原因。在相同压力下,霍尔迁移率在2至12 cm〜2 / V-s之间变化。尽管能带隙保持不变(-2.42 eV),但是由于CdS膜中缺陷的增加,光透射率降低了。卢瑟福背散射光谱显示了CdS薄膜化学计量与沉积压力的关系。 CdS缺陷的存在归因于更多的高能物质到达基板,从而在脉冲激光沉积过程中在CdS膜中引起表面损伤。

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  • 来源
    《Thin Solid Films》 |2014年第1期|665-668|共4页
  • 作者单位

    Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, 75080, USA;

    Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, 75080, USA,Centro de Investigacion en Materiales Avanzados, Monterrey, Nuevo Leon, 66600, Mexico;

    Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, 75080, USA;

    Centro de Investigacion en Materiales Avanzados, Monterrey, Nuevo Leon, 66600, Mexico;

    Instituto de Fisica, Universidade Federal do Rio Grande do Sul, Porto Alegre, 91509-900, Brazil;

    Instituto de Fisica, Universidade Federal do Rio Grande do Sul, Porto Alegre, 91509-900, Brazil;

    Instituto de Fisica, Universidade Federal do Rio Grande do Sul, Porto Alegre, 91509-900, Brazil;

    Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, 75080, USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Pulsed laser deposition; Cadmium sulfide; Sulfur vacancies; Carrier concentration;

    机译:脉冲激光沉积硫化镉;硫空位;载流子浓度;

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