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Electrical and optical properties of Ga_2O_3/CuGaSe_2 heterojunction photoconductors

机译:Ga_2O_3 / CuGaSe_2异质结光电导体的光电性能

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摘要

In this study, the feasibility of using a photoconductor with a Ga_2O_3/CuGaSe_2 heterojunction for visible light sensors was investigated. We propose a hole-blocking structure using gallium oxide (Ga_2O_3) for CuIn_(1-x)Ga_xSe_(1-y)S_y (CIGS) thin film to reduce dark current Experimental results showed that this structure drastically reduced the dark current. Then, avalanche multiplication phenomenon was observed at an applied voltage of over 6 V. However, this structure had sensitivity only in the ultraviolet light region. It seemed the depletion region in the heterojunction spread almost completely in the Ga_2O_3 layer but not in the CIGS layer because the carrier density of the non-doped Ga_2O_3 layer was much lower than that of the CIGS layer. We therefore used tin-doped Ga_2O_3 (Ga_2O_3:Sn) for the n-type layer to increase carrier density. As a result, the depletion region shifted to the CIGS film and the cells had sensitivity in all visible regions. These results indicate that the Ga_2O_3:Sn/CuGaSe_2 heterojunction is feasible for visible light photoconductors.
机译:在这项研究中,研究了将具有Ga_2O_3 / CuGaSe_2异质结的光电导体用于可见光传感器的可行性。我们提出了一种对CuIn_(1-x)Ga_xSe_(1-y)S_y(CIGS)薄膜使用氧化镓(Ga_2O_3)的空穴阻挡结构,以减少暗电流。实验结果表明,该结构极大地降低了暗电流。然后,在超过6V的施加电压下观察到雪崩倍增现象。然而,该结构仅在紫外光区域具有灵敏度。由于未掺杂的Ga_2O_3层的载流子密度比CIGS层的载流子低得多,因此异质结中的耗尽区似乎在Ga_2O_3层中几乎完全扩散,而在CIGS层中没有。因此,我们将掺锡的Ga_2O_3(Ga_2O_3:Sn)用于n型层,以增加载流子密度。结果,耗尽区移动到CIGS膜,并且细胞在所有可见区域具有敏感性。这些结果表明Ga_2O_3:Sn / CuGaSe_2异质结对于可见光光电导体是可行的。

著录项

  • 来源
    《Thin Solid Films》 |2014年第1期|635-637|共3页
  • 作者单位

    NHK Science and Technology Research Laboratories, 1-10-11, Kinuta, Setagaya-ku, Tokyo, 157-8510, Japan,Graduate School of Science and Technology, Keio University, 3-14-1, Hiyoshi, Kouhoku-ku, Yokohama, 223-8522, Japan;

    NHK Science and Technology Research Laboratories, 1-10-11, Kinuta, Setagaya-ku, Tokyo, 157-8510, Japan;

    NHK Science and Technology Research Laboratories, 1-10-11, Kinuta, Setagaya-ku, Tokyo, 157-8510, Japan;

    NHK Science and Technology Research Laboratories, 1-10-11, Kinuta, Setagaya-ku, Tokyo, 157-8510, Japan;

    Graduate School of Science and Technology, Keio University, 3-14-1, Hiyoshi, Kouhoku-ku, Yokohama, 223-8522, Japan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Copper indium gallium selenide; Cadmium free buffer; Gallium oxide;

    机译:硒化铜铟镓;无镉缓冲液;氧化镓;

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