机译:通过热发射磁控溅射沉积纳米晶钛膜
Xian Univ Technol, Xian 710048, Peoples R China;
Xian Univ Technol, Xian 710048, Peoples R China|Nanjing Tech Univ, Nanjing 210000, Jiangsu, Peoples R China;
Xian Univ Technol, Xian 710048, Peoples R China;
Xian Univ Technol, Xian 710048, Peoples R China;
Xian Univ Technol, Xian 710048, Peoples R China;
Magnetron sputtering ion plating; Target current density; Thermal emission; Ionization rate;
机译:反应磁控溅射沉积纳米晶碳化钛薄膜
机译:磁控溅射沉积纳米晶二硼化钛薄膜的表面和纳米压痕研究
机译:溅射功率对RF磁控溅射沉积PbSe纳米晶薄膜性能的影响
机译:射频磁控溅射法在铁氟龙衬底上溅射纳米晶硅薄膜的沉积温度依赖性
机译:通过反应磁控溅射沉积的亚稳态钛(0.5)铝(0.5)铝合金薄膜的物理性能。
机译:反应堆磁控溅射沉积p型缺铜Cu Cr0.95-xMg0.05 O2薄膜的光电性能
机译:DC不平衡磁控溅射沉积的纳米晶(TiZR)XN1-XHIN膜的结构与性能