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Influence of various Si layers on the interlayer thicknesses of then direct current magnetron sputtered Fe/Si multilayers

机译:各种硅层对直流磁控溅射Fe / Si多层膜层间厚度的影响

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摘要

This work investigates the interfacial asymmetry of Fe/Si multilayer films with different thicknesses of Si layer. Four samples of Fe/Si multilayers with monotonically increased Si layer thicknesses were fabricated by using direct current magnetron sputtering technique. Grazing incidence X-ray reflectometry measurement and high resolution transmission electron microscopy were carried out to characterize the inter-diffusion at the interfaces, and selected area electron diffraction technique was u
机译:这项工作研究具有不同厚度的硅层的Fe / Si多层膜的界面不对称性。通过使用直流磁控溅射技术,制作了四个具有单调增加的Si层厚度的Fe / Si多层样品。进行了掠入射X射线反射法测量和高分辨率透射电子显微镜表征界面之间的相互扩散,选择区域电子衍射技术为

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  • 来源
    《Thin Solid Films》 |2015年第1期|312-317|共6页
  • 作者单位

    Tongji Univ, IPOE, MOE Key Lab Adv Microstruct Mat, Shanghai 200092, Peoples R China.;

    Tongji Univ, IPOE, MOE Key Lab Adv Microstruct Mat, Shanghai 200092, Peoples R China.;

    Tongji Univ, IPOE, MOE Key Lab Adv Microstruct Mat, Shanghai 200092, Peoples R China.;

    Univ London Imperial Coll Sci Technol & Med, Dept Phys, Plasma Phys Grp, London SW7 2AZ, England.;

    Tongji Univ, IPOE, MOE Key Lab Adv Microstruct Mat, Shanghai 200092, Peoples R China.;

    Tongji Univ, IPOE, MOE Key Lab Adv Microstruct Mat, Shanghai 200092, Peoples R China.;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Magnetron sputtering; Interface; Fe/Si multilayer;

    机译:磁控溅射;界面;Fe / Si多层;

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