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Effects of oxygen addition in reactive cluster beam deposition of tungsten by magnetron sputtering with gas aggregation

机译:气体聚集的磁控溅射中氧在钨反应性束流沉积中的作用

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摘要

In this work, we investigated the possibilities of tungsten and tungsten oxide nanoclusters generation by means of non-reactive and reactive magnetron sputtering with gas aggregation. It was found that in pure argon atmosphere, cluster aggregation proceeded in two regimes depending on argon pressure in the aggregation chamber. At the lower pressure, cluster generation was dominated by two-body collisions yielding larger clusters (about 5.5 nm in diameter) at lower rate. At higher pressures, cluster generation was dominated by three-body collisions yielding smaller clusters (3-4 nm in diameter) at higher rate. The small amount of oxygen admixture in the aggregation chamber had considerable influence on cluster aggregation process. At certain critical pressure, the presence of oxygen led to the raise of deposition rate and cluster size. Resulting clusters were composed mostly of tungsten trioxide. The oxygen pressure higher than critical led to the target poisoning and the decrease in the sputtering rate. Critical oxygen pressure decreased with increasing argon pressure, suggesting that cluster aggregation process was influenced by atomic oxygen species (namely, O- ion) generated by oxygen-argon collisions in the magnetron plasma. (C) 2015 Elsevier B.V. All rights reserved.
机译:在这项工作中,我们研究了通过气体聚集的非反应性和反应性磁控溅射产生钨和氧化钨纳米簇的可能性。发现在纯氩气氛中,取决于聚集室中的氩气压力,聚集体聚集以两种方式进行。在较低的压力下,团簇的产生主要受两体碰撞的影响,从而以较低的速率产生较大的团簇(直径约5.5 nm)。在较高的压力下,团簇的产生主要受三体碰撞的影响,从而以较高的速率产生较小的团簇(直径为3-4 nm)。聚集室内少量的氧气掺混物对团簇聚集过程有相当大的影响。在一定的临界压力下,氧气的存在导致沉积速率和簇尺寸的增加。产生的簇主要由三氧化钨组成。高于临界压力的氧气压力导致目标中毒并降低了溅射速率。临界氧气压力随着氩气压力的增加而降低,这表明团簇聚集过程受磁控管等离子体中的氧气-氩气碰撞产生的原子氧物种(即O-离子)的影响。 (C)2015 Elsevier B.V.保留所有权利。

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