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Effects of synthesis conditions on electrical properties of chemical solution deposition-derived Pb(Mg1/3Nb2/3)O-3-PbTiO3 thin films

机译:合成条件对化学溶液沉积Pb(Mg1 / 3Nb2 / 3)O-3-PbTiO3薄膜电性能的影响

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Relaxor ferroelectrics Pb(Mg1/3Nb2/3)O-3-PbTiO3 (PMN-PT) have attracted considerable attention because of their excellent electrical properties, which include high dielectricity and piezoelectricity. Their thin films are promising for use as super capacitors and piezoelectric actuators. However, the reported electrical properties of PMN-PT thin films, such as dielectric and piezoelectric properties, are markedly lower than those of bulk ceramics and single-crystals. This study investigated the effects of synthesis conditions such as annealing temperatures, excess lead amounts, and the molecular design of the precursor solution on the electrical properties of the Chemical Solution Deposition (CSD)-derived PMN-PT thin films to deposit single-phase perovskite PMN-PT thin films with superior electrical properties on a Si substrate at lower temperatures. Results of studies demonstrated effectively that suitable processing is necessary to elicit the enhanced electrical properties of PMN-PT thin films, such as introduction of suitable seeding layers and optimization of synthesis conditions. Results show that CSD-derived polycrystalline 0.65PMN-0.35PT thin films with preferred orientation exhibited a higher dielectric constant over 4000 (1 kHz, at room temperature) and higher remanent polarization of P-r = 27.7 mu C/cm(2) (1000 kV/cm, at room temperature) as well as a higher electrostrictive constant of d(33) about 200 pm/V. Further investigation and development are expected to improve these electrical properties of the PMN-PT thin films by stress engineering or residual stress. (C) 2014 Elsevier B.V. All rights reserved.
机译:弛豫铁电体Pb(Mg1 / 3Nb2 / 3)O-3-PbTiO3(PMN-PT)由于其优异的电性能(包括高介电常数和压电性)而备受关注。它们的薄膜有望用作超级电容器和压电致动器。然而,所报道的PMN-PT薄膜的电性能,例如介电和压电性能,明显低于块状陶瓷和单晶。这项研究调查了诸如退火温度,过量铅含量以及前驱体溶液的分子设计等合成条件对化学溶液沉积(CSD)衍生的PMN-PT薄膜电性能的影响,该薄膜沉积了单相钙钛矿。在较低温度下在Si基板上具有优异电性能的PMN-PT薄膜。研究结果有效地表明,必须采取适当的处理工艺来增强PMN-PT薄膜的电性能,例如引入适当的晶种层和优化合成条件。结果表明,具有良好取向的CSD衍生的多晶0.65PMN-0.35PT薄膜在4000(1 kHz,室温)下表现出更高的介电常数,Pr = 27.7μC / cm(2)(1000 kV)时的剩余极化强度更高/ cm,在室温下)以及较高的电致伸缩常数d(33)约200 pm / V。期望通过应力工程或残余应力来进一步研究和开发以改善PMN-PT薄膜的这些电性能。 (C)2014 Elsevier B.V.保留所有权利。

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