Structure and hardness of quaternary TiZrSiN thin films deposited by reactive magnetron co-sputtering

摘要

The addition of Si into (Ti,Zr) N films is considered to be perspective for their hardness enhancement as well as improvement of oxidation and wear resistance. In the present work, the influence of the silicon content and deposition temperature (270 and 600 degrees C) on the structural and mechanical properties of magnetron sputtered TiZrSiN films is investigated. The elemental composition was determined by Rutherford backscattering and wavelength dispersive X-ray spectrometrymethods, the structure and phase formation were analyzed by transmission electron microscopy, X-ray diffraction and X-ray photoelectron spectroscopy. Depending on Si content, x, and deposition temperature, T-s, (Ti,Zr)(1-x)SixNy films were formed in the following states: i) single-phase, cubic (Ti,Zr)N solid solution, ii) dual-phase nanocomposite consisting of nanograins of c-(Ti,Zr)N solid solution surrounded by an amorphous SiNz phase, iii) amorphous phase. Higher deposition temperature (T-s = 600 degrees C) promotes the formation of nanocomposite structure and reduces the intrinsic compressive stress. Themaximum hardness values (26-29 GPa) are observed when Si content is in the range 0.07 <= x <= 0.15 for both deposition temperatures. (C) 2014 Elsevier B.V. All rights reserved.