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首页> 外文期刊>Thin Solid Films >First-principles quantum molecular calculations of structural and mechanical properties of TiN/SiNx heterostructures, and the achievable hardness of the nc-TiN/SiNx nanocomposites
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First-principles quantum molecular calculations of structural and mechanical properties of TiN/SiNx heterostructures, and the achievable hardness of the nc-TiN/SiNx nanocomposites

机译:TiN / SiNx异质结构的结构和力学性能的第一性原理量子分子计算,以及nc-TiN / SiNx纳米复合材料可达到的硬度

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TiN/SiNx heterostructures with one monolayer of the interfacial SiNx have been investigated in the framework of first-principles molecular dynamics calculations in the temperature range of 0 to 1400 K with subsequent static relaxation. The atomic configurations, thermal stability and stress-strain relations have been calculated. Among the heterostructures studied, only the TiN(111)/SiN/TiN(111) and TiN(111)/Si2N3/TiN(111) ones are thermally stable. Upon tensile load, decohesion occurs between the Ti-N bonds adjacent to the SiNx interfacial layer for TiN(001)/SiN/TiN(001) and TiN(111)/Si2N3/TiN(111) heterostructures, and inside the TiN slab for TiN(001)/Si3N4/TiN(001) and TiN(110)/SiN/TiN(110) ones. Upon shear, failure occurs in TiN near the interfaces in all the heterostructures, except for the TiN(001)/Si3N4/TiN(001) one, for which the plastic flow occurs inside the TiN slab. Based on these results we estimate the maximum achievable hardness of nc-TiN/Si3N4 nanocomposites free of impurities to be about 170 GPa. (C) 2015 Elsevier B.V. All rights reserved.
机译:在第一性原理分子动力学计算的框架内,在0至1400 K的温度范围内研究了TiN / SiNx具有单层界面SiNx的异质结构,并随后进行了静态松弛。计算了原子构型,热稳定性和应力-应变关系。在研究的异质结构中,只有TiN(111)/ SiN / TiN(111)和TiN(111)/ Si2N3 / TiN(111)是热稳定的。在拉伸载荷下,与TiN(001)/ SiN / TiN(001)和TiN(111)/ Si2N3 / TiN(111)异质结构的SiNx界面层相邻的Ti-N键之间以及与TiN板内部发生的脱粘TiN(001)/ Si3N4 / TiN(001)和TiN(110)/ SiN / TiN(110)之一。在剪切时,除了TiN(001)/ Si3N4 / TiN(001)以外,所有异质结构中的界面附近的TiN均会发生破坏,在TiN平板内部会发生塑性流动。根据这些结果,我们估计不含杂质的nc-TiN / Si3N4纳米复合材料可达到的最大硬度约为170 GPa。 (C)2015 Elsevier B.V.保留所有权利。

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