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机译:理解退火对(GaIn)(2)O-3膜的影响
Saga Univ, Synchrotron Light Applicat Ctr, Dept Elect & Elect Engn, Saga 8408502, Japan;
Saga Univ, Synchrotron Light Applicat Ctr, Dept Elect & Elect Engn, Saga 8408502, Japan;
Saga Univ, Synchrotron Light Applicat Ctr, Dept Elect & Elect Engn, Saga 8408502, Japan;
Saga Univ, Synchrotron Light Applicat Ctr, Dept Elect & Elect Engn, Saga 8408502, Japan;
Saga Univ, Synchrotron Light Applicat Ctr, Dept Elect & Elect Engn, Saga 8408502, Japan;
Kyushu Univ, Fac Engn, Dept Mat Sci & Engn, Fukuoka 8190395, Japan;
Kyushu Univ, Fac Engn, Dept Mat Sci & Engn, Fukuoka 8190395, Japan;
Saga Univ, Synchrotron Light Applicat Ctr, Dept Elect & Elect Engn, Saga 8408502, Japan;
Semiconductor; Gallium indium oxide; Annealing; X-Ray diffraction; Atomic force microscopy;
机译:Tb掺杂对47(Ba0.7CA0.3)TiO3-0.53Ba(Zr0.2Ti0.8)O-3在各种退火温度下的结构和电性能的影响通过脉冲激光沉积
机译:(Pb0.92La0.08)(Zr0.65Ti0.35)O-3(PLZT)薄膜的后退火温度对ITO涂层的影响
机译:微波等离子体退火对溅射Pb(Zr0.52Ti0.48)O-3薄膜性能的影响及其机理
机译:ZnO膜在(0001)A1_2O_3和(111)Si衬底上沉积的ZnO膜通过MOCVD用作缓冲层的ZnO薄膜生长的GaN层
机译:通过光热加热退火聚合物纳米复合纤维和薄膜:对整体结晶度和形态的影响
机译:退火对GA掺杂的气体感应响应的影响ZnO薄膜
机译:通过电子束蒸发技术制备MGB2薄膜,以及对生长薄膜的退火效应