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Toward the understanding of annealing effects on (GaIn)(2)O-3 films

机译:理解退火对(GaIn)(2)O-3膜的影响

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摘要

(GaIn)(2)O-3 films with nominal indium content of 0.3 deposited at room temperature by pulsed laser deposition have been annealed in different gas ambient (N-2, vacuum, Ar, O-2) and temperatures (700-1000 degrees C) in order to understand the annealing effects. X-ray diffraction and X-ray rocking curve revealed that the film annealed at 800 degrees C under O-2 ambient has best crystallinity. X-ray photoelectron spectroscopy analysis indicated that oxygen ambient annealing has greatly helped on decreasing the oxygen vacancy. (GaIn)(2)O-3 films with different nominal indium content varying from 0.2 to 0.7 annealed at 800 degrees C under O-2 ambient also showed high crystal quality, improved optical transmittance, and smooth surface. (C) 2015 Elsevier B.V. All rights reserved.
机译:在室温下通过脉冲激光沉积沉积的标称铟含量为0.3的(GaIn)(2)O-3薄膜已在不同的气体环境(N-2,真空,Ar,O-2)和温度(700-1000)下退火度C)以了解退火效果。 X射线衍射和X射线摇摆曲线表明,在O-2环境下于800℃退火的膜具有最佳结晶度。 X射线光电子能谱分析表明,氧环境退火对减少氧空位有很大帮助。在O-2环境下于800摄氏度退火的标称铟含量不同的(GaIn)(2)O-3薄膜在0.2摄氏度至0.7摄氏度之间也表现出较高的晶体质量,改善的透光率和光滑的表面。 (C)2015 Elsevier B.V.保留所有权利。

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  • 来源
    《Thin Solid Films》 |2015年第2期|1-6|共6页
  • 作者单位

    Saga Univ, Synchrotron Light Applicat Ctr, Dept Elect & Elect Engn, Saga 8408502, Japan;

    Saga Univ, Synchrotron Light Applicat Ctr, Dept Elect & Elect Engn, Saga 8408502, Japan;

    Saga Univ, Synchrotron Light Applicat Ctr, Dept Elect & Elect Engn, Saga 8408502, Japan;

    Saga Univ, Synchrotron Light Applicat Ctr, Dept Elect & Elect Engn, Saga 8408502, Japan;

    Saga Univ, Synchrotron Light Applicat Ctr, Dept Elect & Elect Engn, Saga 8408502, Japan;

    Kyushu Univ, Fac Engn, Dept Mat Sci & Engn, Fukuoka 8190395, Japan;

    Kyushu Univ, Fac Engn, Dept Mat Sci & Engn, Fukuoka 8190395, Japan;

    Saga Univ, Synchrotron Light Applicat Ctr, Dept Elect & Elect Engn, Saga 8408502, Japan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Semiconductor; Gallium indium oxide; Annealing; X-Ray diffraction; Atomic force microscopy;

    机译:半导体;氧化铟镓;退火;X射线衍射;原子力显微镜;

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