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Growth and physical properties of highly oriented La-doped (K,Na)NbO3 ferroelectric thin films

机译:高取向掺La(K,Na)NbO3铁电薄膜的生长和物理性能

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摘要

Lead-free (K,Na)NbO3 (KNN) and La doped (K,Na)NbO3 (KNN-La) thin films are grown on SrTiO3 substrates using the chemical solution deposition method. The effect of adding different amounts of Na and K excess (0-20 mol%) is investigated. The results confirm the necessity of adding 20 mol% excess amounts of Na and K precursor solutions in order to avoid the formation of the secondary phase, K4Nb6O17, as confirmed by X-ray diffraction and Raman spectroscopy. Moreover, when adding a 20 mol% of alkaline metal excess, the thin films are highly textured with out-of-plane preferential orientation in the [100] direction of the [100] orientation of the substrate. Doping with lanthanum results in a decrease of the leakage current density at low electric field, and an increase in the dielectric permittivity across the whole temperature range (80-380 K). Although the (100)-oriented KNN and KNN-La films exhibited rounded hysteresis loops, at low temperatures the films show the typical ferroelectric hysteresis loops. (C) 2015 Elsevier B.V. All rights reserved.
机译:使用化学溶液沉积方法在SrTiO3衬底上生长无铅(K,Na)NbO3(KNN)和掺La的(K,Na)NbO3(KNN-La)薄膜。研究了添加不同量的Na和K过量(0-20 mol%)的效果。结果证实,如通过X射线衍射和拉曼光谱法所证实的,为了避免形成第二相K 4 Nb 6 O 17,有必要添加过量的20mol%的Na和K前体溶液。此外,当添加过量的20摩尔%的碱金属时,薄膜具有在基板的[100]方向的[100]方向上具有面外优先取向的高度纹理化。镧掺杂会降低低电场下的漏电流密度,并在整个温度范围(80-380 K)内提高介电常数。尽管(100)取向的KNN和KNN-La薄膜显示出圆形的磁滞回线,但在低温下,这些膜却显示出典型的铁电磁滞回线。 (C)2015 Elsevier B.V.保留所有权利。

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  • 来源
    《Thin Solid Films》 |2015年第27期|35-41|共7页
  • 作者单位

    Univ Barcelona, Dept Quim Inorgan, E-08028 Barcelona, Spain;

    Univ Nacl Autonoma Mexico, Ctr Nanociencias & Nanotecnol, Ensenada 22860, Baja California, Mexico;

    Univ Politecn Cataluna, BarcelonaTech, Dept Appl Phys, ES-08034 Barcelona, Spain;

    Univ Politecn Cataluna, BarcelonaTech, Dept Appl Phys, ES-08034 Barcelona, Spain;

    Univ Barcelona, Dept Quim Inorgan, E-08028 Barcelona, Spain;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    Chemical solution deposition; (K0.5Na0.5)NbO3; Ferroelectric; Thin films;

    机译:化学溶液沉积;(K0.5Na0.5)NbO3;铁电;薄膜;

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