机译:高取向掺La(K,Na)NbO3铁电薄膜的生长和物理性能
Univ Barcelona, Dept Quim Inorgan, E-08028 Barcelona, Spain;
Univ Nacl Autonoma Mexico, Ctr Nanociencias & Nanotecnol, Ensenada 22860, Baja California, Mexico;
Univ Politecn Cataluna, BarcelonaTech, Dept Appl Phys, ES-08034 Barcelona, Spain;
Univ Politecn Cataluna, BarcelonaTech, Dept Appl Phys, ES-08034 Barcelona, Spain;
Univ Barcelona, Dept Quim Inorgan, E-08028 Barcelona, Spain;
Chemical solution deposition; (K0.5Na0.5)NbO3; Ferroelectric; Thin films;
机译:高于C取向外延Aurivillius Babi_4Ti_4O_(15)薄膜的生长和铁电性能
机译:溶胶-凝胶法低温制备高取向无铅(Na,K)NbO3薄膜
机译:具有ZnO缓冲层的高c轴取向铁电LiNbO
机译:高取向La掺杂(K,Na)NbO3铁电薄膜
机译:二氧化铬 - 低温薄膜生长,结构和物理性质
机译:(004)高取向立方锌共混物ZnO薄膜的发光特性
机译:高取向La掺杂(K,Na)NbO3铁电薄膜的生长和物理性质