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Effects of ZnO buffer layers on growth, electrical properties and crystallinity of vanadium-doped ZnO

机译:ZnO缓冲层对掺钒ZnO的生长,电学性能和结晶度的影响

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Transparent conducive oxides have attracted much attention in the field of optoelectronic device applications. Among these materials, vanadium-doped zinc oxide is unique for its piezoelectricity, transparency, and electric conductivity. In this paper, we investigate the effects of zinc oxide buffer layers on the formation of vanadium-doped zinc oxide. We find that zinc oxide buffer layer thicker than 10 nm has oriented crystal structure, and promote the formation of highly oriented vanadium-doped zinc oxide by reducing electrically inactive layer at the interface. Our investigation indicates that zinc-oxide-based conducive film can be formed by introducing the buffer layer under appropriate conditions. These results provide important information for industrial application of transparent conductive materials.
机译:透明导电氧化物已在光电器件应用领域引起了广泛关注。在这些材料中,钒掺杂的氧化锌因其压电性,透明性和导电性而独特。在本文中,我们研究了氧化锌缓冲层对钒掺杂氧化锌形成的影响。我们发现,厚度大于10 nm的氧化锌缓冲层具有定向晶体结构,并通过减少界面处的电惰性层来促进高度取向的掺钒氧化锌的形成。我们的研究表明,可以通过在适当的条件下引入缓冲层来形成基于氧化锌的导电膜。这些结果为透明导电材料的工业应用提供了重要的信息。

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